SCHEMBL17183757

SCHEMBL17183757

C=C(CC(C)C(C)C)C(N)=O

nearest known ligand 0.39

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.38
SLC7A5 Q01650 1/20 0.33
GRIK1 P39086 1/20 0.32
GRIK2 Q13002 1/20 0.32
GRM1 Q13255 1/20 0.32
GRM2 Q14416 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17010198 0.84 TDP1 (0.36) TDP1SLC7A5GRIK1GRIK2GRM1
SCHEMBL913310 0.80
SCHEMBL11747319 0.78 TET2 (0.50) TDP1SLC7A5GRIK1GRIK2GRM1
SCHEMBL4725299 0.78
SCHEMBL444938 0.78
SCHEMBL3099788 0.74 GABRR1 (0.43) TDP1SLC7A5GRIK1GRIK2GRM1
SCHEMBL3230407 0.74 TDP1 (0.36) TDP1GRIK1GRIK2GRM1GRM2
SCHEMBL732270 0.74 TDP1 (0.36) TDP1GRIK1GRIK2GRM1GRM2
SCHEMBL28554682 0.74 TDP1 (0.42) TDP1GRIK1GRIK2GRM1GRM2
SCHEMBL24771277 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11492432-B2 Resin for nanoimprinting, laminate containing resin for nanoimprinting, printed board containing resin for nanoimprinting, and method for producing nanoimprint substrate JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) 2022-11-08 US disclosed
US-20200223125-A1 RESIN FOR NANOIMPRINTING, LAMINATE CONTAINING RESIN FOR NANOIMPRINTING, PRINTED BOARD CONTAINING RESIN FOR NANOIMPRINTING, AND METHOD FOR PRODUCING NANOIMPRINT SUBSTRATE JAPAN SCIENCE & TECH AGENCY (JP) 2020-07-16 US disclosed
US-20150298387-A1 RESIN FOR NANOIMPRINTING, LAMINATE CONTAINING RESIN FOR NANOIMPRINTING, PRINTED BOARD CONTAINING RESIN FOR NANOIMPRINTING, AND METHOD FOR PRODUCING NANOIMPRINT SUBSTRATE JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) 2015-10-22 US disclosed