⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17199342 | 0.89 | LMNA (0.30) | — | |
| SCHEMBL17199314 | 0.86 | — | — | |
| SCHEMBL17199326 | 0.83 | — | — | |
| SCHEMBL17195518 | 0.80 | — | — | |
| SCHEMBL24268509 | 0.79 | CA1 (0.34) | — | |
| SCHEMBL24776344 | 0.78 | MAPT (0.31) | — | |
| SCHEMBL18785601 | 0.77 | LMNA (0.42) | — | |
| SCHEMBL13411207 | 0.77 | — | — | |
| SCHEMBL17195512 | 0.76 | LMNA (0.34) | — | |
| SCHEMBL1672350 | 0.76 | LMNA (0.49) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9366958-B2 | Photoacid generator, chemically amplified resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-14 | — | — | US | disclosed |
| US-20150301449-A1 | PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-10-22 | — | — | US | disclosed |