⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4921184 | 0.84 | TSHR (0.41) | — | |
| SCHEMBL1701000 | 0.84 | — | — | |
| SCHEMBL65283 | 0.84 | — | — | |
| Water SCHEMBL27453712 | 0.81 | — | — | |
| SCHEMBL10400438 | 0.81 | — | — | |
| Hydrochloric Acid SCHEMBL2139309 | 0.81 | — | — | |
| SCHEMBL6662347 | 0.81 | — | — | |
| Isopropyl Alcohol SCHEMBL634928 | 0.81 | ALDH1A1 (0.40) | — | |
| SCHEMBL7952961 | 0.79 | — | — | |
| Hydroxyamine SCHEMBL16774695 | 0.79 | TSHR (0.44) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1031884-B1 | Resist stripping agent and process of producing semiconductor devices using the same | MITSUBISHI GAS CHEMICAL CO (JP) | 2012-01-11 | — | — | EP | claimed |
| US-6638694-B2 | Mixtures of amines, water soluble solvents and corrosion resistance agents, used for removing photoresist films and residues after etching semiconductor integrated circuits or liquid crystal displays | MITSUBISHI GAS CHEMICAL COMPANY, INC (JP) | 2003-10-28 | — | — | US | claimed |
| US-20030186175-A1 | RESIST STRIPPING AGENT AND PROCESS OF PRODUCING SEMICONDUCTOR DEVICES USING THE SAME | IKEMOTO KAZUTO (JP) | 2003-10-02 | — | — | US | claimed |
| EP-1031884-A2 | Resist stripping agent and process of producing semiconductor devices using the same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2000-08-30 | — | — | EP | claimed |
| US-8163095-B2 | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-04-24 | — | — | US | disclosed |
| EP-1031884-B1 | Resist stripping agent and process of producing semiconductor devices using the same | MITSUBISHI GAS CHEMICAL CO (JP) | 2012-01-11 | — | — | EP | disclosed |
| US-20110206829-A1 | COMPOSITION FOR STRIPPING AND STRIPPING METHOD | SAMSUNG DISPLAY CO., LTD. (KR) | 2011-08-25 | — | — | US | disclosed |
| US-7968507-B2 | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-06-28 | — | — | US | disclosed |
| US-7862807-B2 | Dendrimers as molecular translocators | UNIVERSITY OF CALIFORNIA, SAN DIEGO (US) | 2011-01-04 | — | — | US | disclosed |
| US-20090084406-A1 | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO., LTD. | 2009-04-02 | — | — | US | disclosed |
| EP-1545462-A4 | DENDRIMERS AS MOLECULAR TRANSLOCATORS | UNIV CALIFORNIA (US) | 2007-08-08 | — | — | EP | disclosed |
| US-20060216265-A1 | Dendrimers as molecular translocators | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA | 2006-09-28 | — | — | US | disclosed |
| WO-2004009665-A2 | DENDRIMERS AS MOLECULAR TRANSLOCATORS | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 2004-01-29 | — | — | WO | disclosed |
| WO-2004009666-A2 | DENDRIMERS AS MOLECULAR TRANSLOCATORS | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 2004-01-29 | — | — | WO | disclosed |
| US-6638694-B2 | Mixtures of amines, water soluble solvents and corrosion resistance agents, used for removing photoresist films and residues after etching semiconductor integrated circuits or liquid crystal displays | MITSUBISHI GAS CHEMICAL COMPANY, INC (JP) | 2003-10-28 | — | — | US | disclosed |
| EP-0877060-B1 | Rheology control agents for high solids thermoset coatings | LUBRIZOL CORP (US) | 2003-10-22 | — | — | EP | disclosed |
| US-20030186175-A1 | RESIST STRIPPING AGENT AND PROCESS OF PRODUCING SEMICONDUCTOR DEVICES USING THE SAME | IKEMOTO KAZUTO (JP) | 2003-10-02 | — | — | US | disclosed |
| EP-1031884-A2 | Resist stripping agent and process of producing semiconductor devices using the same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2000-08-30 | — | — | EP | disclosed |
| US-6008278-A | COATING COMPOSITION OF A FILM FORMING RESIN; RHEOLOGY CONTROL AGENT COMPRISING THE REACTION PRODUCT OF A CARBOXYLIC ACID ACYLATING AGENT AND A HYDROXYAMINE OR HYDROXYIMINE OF GIVEN FORMULAS; AND A PIGMENT | THE LUBRIZOL CORPORATION (US) | 1999-12-28 | — | — | US | disclosed |
| EP-0877060-A2 | Rheology control agents for high solids thermoset coatings | The Lubrizol Corporation (US) | 1998-11-11 | — | — | EP | disclosed |