⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17771604 | 1.00 | — | — | |
| SCHEMBL1317128 | 0.97 | — | — | |
| SCHEMBL27538447 | 0.97 | — | — | |
| SCHEMBL19004031 | 0.97 | — | — | |
| SCHEMBL14607945 | 0.90 | — | — | |
| SCHEMBL2101136 | 0.83 | — | — | |
| SCHEMBL23343727 | 0.75 | — | — | |
| SCHEMBL16384657 | 0.73 | — | — | |
| SCHEMBL22433104 | 0.71 | — | — | |
| SCHEMBL20738459 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023195407-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2023-10-12 | — | — | WO | disclosed |
| CN-107739295-A | A kind of rhodium catalysis prepares alkane iodide method | 云南民族大学 | 2018-02-27 | — | — | CN | disclosed |
| US-20170339929-A1 | HCO32 AND HCO27 AND RELATED EXAMPLES | MEDAREX, INC. | 2017-11-30 | — | — | US | disclosed |
| US-9693539-B2 | HCO32 and HCO27 and related examples | E. R. SQUIBB & SONS, L.L.C. (US) | 2017-07-04 | — | — | US | disclosed |
| EP-2413191-B1 | Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith | FUJIFILM CORP (JP) | 2016-09-07 | — | — | EP | disclosed |
| WO-2015162459-A1 | AMINO PYRAZINE DERIVATIVES AS PHOSPHATIDYLINOSITOL 3-KINASE INHIBITORS | NOVARTIS AG (CH) | 2015-10-29 | — | — | WO | disclosed |
| EP-2426154-A1 | Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition | Fujifilm Corporation (JP) | 2012-03-07 | — | — | EP | disclosed |