SCHEMBL19004031

SCHEMBL19004031

CCC1(I)CCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL172017 0.97
SCHEMBL17771604 0.97
SCHEMBL27538447 0.94
SCHEMBL1317128 0.94
SCHEMBL14607945 0.93
SCHEMBL2101136 0.86
SCHEMBL16384657 0.75
SCHEMBL20738459 0.73
SCHEMBL24284093 0.73
SCHEMBL21744369 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106518866-A Azaindole compound used as glucokinase activator 北京万全德众医药生物技术有限公司 2017-03-22 CN claimed
WO-2024142681-A1 RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN JSR株式会社 2024-07-04 WO disclosed
US-20230192592-A1 MONOMER AND POLYMER, COMPENSATION FILM, OPTICAL FILM, AND DISPLAY DEVICE SAMSUNG ELECTRONICS CO LTD (KR) 2023-06-22 US disclosed
US-20210141308-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2021-05-13 US disclosed
US-20210055656-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2021-02-25 US disclosed
US-10394122-B2 Resist composition, method for forming resist pattern, compound, and acid generator TOYKO OHKA KOGYO CO., LTD. (JP) 2019-08-27 US disclosed
US-10261416-B2 Resist composition and method for forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2019-04-16 US disclosed
US-9991114-B2 Photolithographic patterning of electronic devices ORTHOGONAL, INC. (US) 2018-06-05 US disclosed
US-20180067394-A1 RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2018-03-08 US disclosed
US-20170287694-A1 PHOTOLITHOGRAPHIC PATTERNING OF ELECTRONIC DEVICES ORTHOGONAL, INC. (US) 2017-10-05 US disclosed
US-20170221995-A1 SPLIT-ELECTRODE VERTICAL CAVITY OPTICAL DEVICE THE UNIVERSITY OF CONNECTICUT (US) 2017-08-03 US disclosed
US-20170222400-A1 OPTOELECTRONIC INTEGRATED CIRCUIT THE UNIVERSITY OF CONNECTICUT (US) 2017-08-03 US disclosed
US-20170179684-A1 DUAL WAVELENGTH HYBRID DEVICE THE UNIVERSITY OF CONNECTICUT (US) 2017-06-22 US disclosed
CN-106518866-A Azaindole compound used as glucokinase activator 北京万全德众医药生物技术有限公司 2017-03-22 CN disclosed