⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2697376 | 0.91 | — | — | |
| Carbon Monoxide SCHEMBL888058 | 0.88 | — | — | |
| Hydrochloric Acid SCHEMBL10980991 | 0.88 | — | — | |
| Fluoride SCHEMBL14954374 | 0.88 | — | — | |
| Iodide SCHEMBL14953796 | 0.88 | — | — | |
| SCHEMBL14954321 | 0.88 | — | — | |
| Bromide SCHEMBL14953899 | 0.88 | — | — | |
| Hydrochloric Acid SCHEMBL14954185 | 0.88 | — | — | |
| SCHEMBL10609979 | 0.86 | — | — | |
| SCHEMBL9326836 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150311437-A1 | METHODS OF FORMING A MEMORY CELL MATERIAL, AND RELATED METHODS OF FORMING A SEMICONDUCTOR DEVICE STRUCTURE, MEMORY CELL MATERIALS, AND SEMICONDUCTOR DEVICE STRUCTURES | MICRON TECHNOLOGY, INC. (US) | 2015-10-29 | — | — | US | claimed |
| WO-2015164215-A1 | METHODS OF FORMING A MEMORY CELL MATERIAL, AND RELATED METHODS OF FORMING A SEMICONDUCTOR DEVICE STRUCTURE, MEMORY CELL MATERIALS, AND SEMICONDUCTOR DEVICE | MICRON TECHNOLOGY, INC. (US) | 2015-10-29 | — | — | WO | claimed |
| US-10388872-B2 | Memory cell materials and semiconductor device structures | MICRON TECHNOLOGY, INC. (US) | 2019-08-20 | — | — | US | disclosed |
| US-20170309820-A1 | MEMORY CELL MATERIALS AND SEMICONDUCTOR DEVICE STRUCTURES | MICRON SEMICONDUCTOR PRODUCTS, INC. | 2017-10-26 | — | — | US | disclosed |
| US-9735359-B2 | Methods of forming a memory cell material, and related methods of forming a semiconductor device structure, memory cell materials, and semiconductor device structures | MICRON TECHNOLOGY, INC. (US) | 2017-08-15 | — | — | US | disclosed |
| WO-2015164215-A1 | METHODS OF FORMING A MEMORY CELL MATERIAL, AND RELATED METHODS OF FORMING A SEMICONDUCTOR DEVICE STRUCTURE, MEMORY CELL MATERIALS, AND SEMICONDUCTOR DEVICE | MICRON TECHNOLOGY, INC. (US) | 2015-10-29 | — | — | WO | disclosed |
| US-20150311437-A1 | METHODS OF FORMING A MEMORY CELL MATERIAL, AND RELATED METHODS OF FORMING A SEMICONDUCTOR DEVICE STRUCTURE, MEMORY CELL MATERIALS, AND SEMICONDUCTOR DEVICE STRUCTURES | MICRON TECHNOLOGY, INC. (US) | 2015-10-29 | — | — | US | disclosed |