Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 5/20 | 0.41 |
| ▸ | CA2 | P00918 | 8/20 | 0.39 |
| ▸ | CA1 | P00915 | 4/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | CTSK | P43235 | 2/20 | 0.33 |
| ▸ | FDPS | P14324 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23494061 | 0.86 | TSHR (0.39) | TSHRTHRBALDH1A1 | |
| SCHEMBL9768558 | 0.82 | TSHR (0.42) | TSHRCA2CA1MAPK1CTSK | |
| SCHEMBL27605638 | 0.79 | TSHR (0.37) | TSHRCA2CA1MAPK1FDPS | |
| SCHEMBL11753538 | 0.77 | TSHR (0.45) | TSHRCA2CA1FDPS | |
| SCHEMBL15124634 | 0.77 | TSHR (0.41) | TSHRCA1FDPSTHRB | |
| SCHEMBL27504175 | 0.76 | TSHR (0.40) | TSHRCA2CA1MAPK1CTSK | |
| SCHEMBL10171006 | 0.75 | CA2 (0.40) | TSHRCA2CA1MAPK1CTSK | |
| SCHEMBL23494263 | 0.75 | TSHR (0.40) | TSHRTHRBALDH1A1 | |
| SCHEMBL23494309 | 0.74 | TSHR (0.42) | TSHRTHRBALDH1A1 | |
| SCHEMBL27928065 | 0.74 | TSHR (0.40) | TSHRCA2CA1MAPK1CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2426154-A1 | Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition | Fujifilm Corporation (JP) | 2012-03-07 | — | — | EP | disclosed |
| EP-2020615-A1 | Positive resist composition and pattern forming method | FUJIFILM Corporation (JP) | 2009-02-04 | — | — | EP | disclosed |