SCHEMBL1720306

SCHEMBL1720306

CCC(Cl)C([SiH3])(Cl)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3353413 0.75
SCHEMBL131329 0.73
SCHEMBL15878918 0.71
SCHEMBL10713761 0.71
SCHEMBL195945 0.71
SCHEMBL17967547 0.69
SCHEMBL834175 0.69
SCHEMBL4160453 0.69
SCHEMBL5368342 0.69
SCHEMBL831645 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104418873-B Compounds having guanidino groups and containing a semi-organosilicon group 赢创运营有限公司 2020-12-01 CN disclosed
US-9790327-B2 Silicone resin compositions which can be cured at room temperature EVONIK DEGUSSA GMBH (DE) 2017-10-17 US disclosed
US-20160208050-A1 SILICONE RESIN COMPOSITIONS WHICH CAN BE CURED AT ROOM TEMPERATURE EVONIK DEGUSSA GMBH (DE) 2016-07-21 US disclosed
US-9353225-B2 Compounds having guanidine groups and containing semi-organic silicon groups EVONIK DEGUSSA GMBH (DE) 2016-05-31 US disclosed
US-9150422-B2 Porous metal oxide, method for producing the same, and use of the same MITSUI CHEMICALS, INC. (JP) 2015-10-06 US disclosed
US-20150057412-A1 COMPOUNDS HAVING GUANIDINE GROUPS AND CONTAINING SEMI-ORGANIC SILICON GROUPS EVONIK DEGUSSA GMBH (DE) 2015-02-26 US disclosed
EP-2407427-A1 NOVEL POROUS METAL OXIDE, PROCESS FOR PRODUCING SAME, AND USE OF SAME Mitsui Chemicals, Inc. (JP) 2012-01-18 EP disclosed
US-20110318249-A1 NOVEL POROUS METAL OXIDE, METHOD FOR PRODUCING THE SAME, AND USE OF THE SAME MITSUI CHEMICALS, INC. (JP) 2011-12-29 US disclosed