SCHEMBL17264806

SCHEMBL17264806

CCC(C)(C)C(=O)OCC(=O)OC1C2CC3(C(F)(F)F)C(=O)OC1C3O2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12753783 0.90 HMGCR (0.34) —
SCHEMBL12832727 0.84 — —
SCHEMBL12761133 0.83 — —
SCHEMBL13137738 0.82 — —
SCHEMBL2740786 0.82 — —
SCHEMBL12761138 0.81 — —
SCHEMBL12761142 0.81 — —
SCHEMBL2740783 0.80 — —
SCHEMBL25701314 0.79 — —
SCHEMBL12753599 0.79 HMGCR (0.33) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150331314-A1 PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-11-19 — — US disclosed
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