SCHEMBL17271346

SCHEMBL17271346

FC(F)(F)C(F)(F)Oc1cccc2ccccc12

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 3/20 0.50
▸ KDM4E B2RXH2 3/20 0.50
▸ HSD17B10 Q99714 2/20 0.50
▸ HTR1B P28222 7/20 0.43
▸ HTT P42858 1/20 0.43
▸ HPGD P15428 2/20 0.41
▸ KCNA3 P22001 1/20 0.41
▸ TDP1 Q9NUW8 1/20 0.41
▸ PGR P06401 1/20 0.40
▸ GAA P10253 1/20 0.40
▸ PTGS1 P23219 1/20 0.40
▸ MAPK1 P28482 1/20 0.40
▸ HTR1D P28221 1/20 0.40
▸ MEN1 O00255 2/20 0.39
▸ KMT2A Q03164 2/20 0.39
▸ SLC6A4 P31645 2/20 0.39
▸ HRH1 P35367 1/20 0.39
▸ RAB9A P51151 1/20 0.39
▸ L3MBTL1 Q9Y468 1/20 0.39
▸ CYP1A2 P05177 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17537056 0.86 ALDH1A1 (0.49) ALDH1A1KDM4EHSD17B10HTR1BHTT
SCHEMBL3120591 0.83 KDM4E (0.53) ALDH1A1KDM4EHSD17B10HTR1BHTT
SCHEMBL16178487 0.82 ALDH1A1 (0.49) ALDH1A1KDM4EHSD17B10HTR1BHTT
SCHEMBL20002024 0.81 ALDH1A1 (0.56) ALDH1A1KDM4EHSD17B10HTR1BHTT
SCHEMBL10713653 0.81 ALDH1A1 (0.47) ALDH1A1KDM4EHSD17B10HTR1BHTT
SCHEMBL10600724 0.80 CA12 (0.35) ALDH1A1GAASLC6A4
SCHEMBL16886218 0.78 ALDH1A1 (0.53) ALDH1A1KDM4EHSD17B10HTR1BHTT
SCHEMBL10083982 0.78 ALDH1A1 (0.49) ALDH1A1KDM4EHSD17B10HTR1BHTT
SCHEMBL15157392 0.77 ALDH1A1 (0.56) ALDH1A1KDM4EHSD17B10HTR1BHTT
SCHEMBL8026143 0.77 ALDH1A1 (0.55) ALDH1A1KDM4EHSD17B10HTR1BHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9519214-B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, pattern forming method, process for manufacturing electronic device and electronic device FUJIFILM CORPORATION (JP) 2016-12-13 — — US disclosed
US-20150338732-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, PROCESS FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-11-26 — — US disclosed
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