SCHEMBL17280576

SCHEMBL17280576

CCC(O)COc1ccc2c(OCC(O)COc3ccc4cc(OC)ccc4c3)cccc2c1

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 4/20 0.66
TSHR P16473 2/20 0.49
MAPK1 P28482 2/20 0.49
NR2E1 Q9Y466 5/20 0.48
KDM4E B2RXH2 2/20 0.46
CYP1A2 P05177 4/20 0.46
MEN1 O00255 1/20 0.46
CYP2C19 P33261 1/20 0.46
KMT2A Q03164 1/20 0.46
CASR P41180 1/20 0.44
DRD4 P21917 1/20 0.44
ADRB2 P07550 3/20 0.43
ADRB1 P08588 3/20 0.43
SLC6A4 P31645 3/20 0.43
HTR2B P41595 3/20 0.43
SIGMAR1 Q99720 3/20 0.43
ALDH1A1 P00352 2/20 0.43
ADRB3 P13945 2/20 0.43
HTR2A P28223 2/20 0.43
HTR2C P28335 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17280574 0.86 CYP2D6 (0.53) CYP2D6TSHRMAPK1NR2E1KDM4E
SCHEMBL17280580 0.82 CYP2D6 (0.49) CYP2D6TSHRNR2E1KDM4ECYP1A2
SCHEMBL26425959 0.81 CYP2D6 (0.58) CYP2D6TSHRMAPK1NR2E1KDM4E
SCHEMBL28680552 0.80 CYP2D6 (1.00) CYP2D6TSHRMAPK1NR2E1KDM4E
SCHEMBL28680554 0.80 CYP2D6 (1.00) CYP2D6TSHRMAPK1NR2E1KDM4E
SCHEMBL27902832 0.79 CYP1A2 (0.55) CYP2D6TSHRMAPK1NR2E1KDM4E
Hydrochloric Acid SCHEMBL11231352 0.79 CYP2D6 (0.98) CYP2D6TSHRMAPK1NR2E1KDM4E
SCHEMBL23896249 0.79 CYP2D6 (0.57) CYP2D6TSHRMAPK1NR2E1KDM4E
SCHEMBL13572916 0.78 TSHR (0.76) TSHRMAPK1KDM4EMEN1KMT2A
SCHEMBL12879452 0.77 CYP2D6 (0.56) CYP2D6TSHRKDM4ECYP1A2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9534140-B2 Resist underlayer film-forming composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-01-03 US disclosed
US-20150337164-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-11-26 US disclosed