SCHEMBL23896249

SCHEMBL23896249

CC(C)(C)CC(O)COc1ccc2c(OCC(O)CC(C)(C)C)cccc2c1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 4/20 0.57
CYP1A2 P05177 4/20 0.49
KDM4E B2RXH2 1/20 0.49
MEN1 O00255 1/20 0.49
CYP2C19 P33261 1/20 0.49
KMT2A Q03164 1/20 0.49
NR2E1 Q9Y466 5/20 0.48
ADRB2 P07550 4/20 0.46
ADRB1 P08588 4/20 0.46
SIGMAR1 Q99720 4/20 0.46
SLC6A4 P31645 3/20 0.46
HTR2B P41595 3/20 0.46
ALDH1A1 P00352 3/20 0.46
ADRB3 P13945 3/20 0.46
HTR2A P28223 3/20 0.46
HTR2C P28335 3/20 0.46
HTR6 P50406 3/20 0.46
SCN1A P35498 2/20 0.46
SLC10A1 Q14973 2/20 0.46
SCN2A Q99250 2/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23896255 0.95 CYP2D6 (0.56) CYP2D6CYP1A2KDM4EMEN1CYP2C19
SCHEMBL27351914 0.81 CYP2D6 (0.49) CYP2D6CYP1A2KDM4EMEN1CYP2C19
SCHEMBL26425959 0.80 CYP2D6 (0.58) CYP2D6CYP1A2KDM4EMEN1CYP2C19
SCHEMBL17280576 0.79 CYP2D6 (0.66) CYP2D6CYP1A2KDM4EMEN1CYP2C19
SCHEMBL27352312 0.76 CYP2D6 (0.44) CYP2D6CYP1A2KDM4EMEN1CYP2C19
SCHEMBL13853175 0.75 CYP1A2 (0.69) CYP2D6CYP1A2KDM4EMEN1CYP2C19
SCHEMBL16489898 0.73 CYP2D6 (0.48) CYP2D6CYP1A2KDM4EMEN1CYP2C19
SCHEMBL17552840 0.73 CYP1A2 (0.49) CYP2D6CYP1A2KDM4EMEN1CYP2C19
SCHEMBL23339076 0.73 CYP2D6 (0.40) CYP2D6CYP1A2KDM4EMEN1CYP2C19
SCHEMBL28680554 0.73 CYP2D6 (1.00) CYP2D6CYP1A2KDM4EMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210311396-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2021-10-07 US disclosed