⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31525968 | 1.00 | — | — | |
| Chloroform SCHEMBL19521440 | 0.91 | IDO1 (0.48) | — | |
| SCHEMBL17961541 | 0.82 | — | — | |
| SCHEMBL11741449 | 0.79 | APOBEC3G (0.39) | — | |
| SCHEMBL3164443 | 0.79 | TAAR1 (0.60) | — | |
| SCHEMBL30813041 | 0.79 | TAAR1 (0.60) | — | |
| SCHEMBL29366632 | 0.78 | APOBEC3G (0.60) | — | |
| SCHEMBL41139 | 0.78 | APOBEC3G (0.60) | — | |
| SCHEMBL16954975 | 0.75 | PNMT (0.37) | — | |
| SCHEMBL16956748 | 0.75 | GABRA1 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 711 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119613373-A | Benzoiodooxapentanes Process for preparing cyclic reagents | 华中科技大学 | 2025-03-14 | — | — | CN | claimed |
| CN-118184818-A | Functionalized high molecular polymer, visualized embolism microsphere prepared by microfluidic technology and application | 四川大学 | 2024-06-14 | — | — | CN | claimed |
| CN-117586440-B | Iodinated polyhydroxy polymer, preparation method and liquid embolic agent prepared from iodinated polyhydroxy polymer | 苏州美创医疗科技有限公司 | 2024-04-09 | — | — | CN | claimed |
| CN-117586440-A | Iodinated polyhydroxy polymer, preparation method and liquid embolic agent prepared from iodinated polyhydroxy polymer | 苏州美创医疗科技有限公司 | 2024-02-23 | — | — | CN | claimed |
| CN-113354655-B | Bis-benzo [5,6] spiroketal compound and preparation method thereof | 威胜生物医药(苏州)股份有限公司 | 2022-12-13 | — | — | CN | claimed |
| CN-111518105-B | Preparation method of glycocyclo-pyrrole cyclic compound | 华东师范大学 | 2022-11-01 | — | — | CN | claimed |
| CN-114805644-B | Nontransmissive polymer and preparation method and application thereof | 苏州美创医疗科技有限公司 | 2022-09-16 | — | — | CN | claimed |
| CN-114805644-A | Nontransmissive polymer and preparation method and application thereof | 苏州美创医疗科技有限公司 | 2022-07-29 | — | — | CN | claimed |
| CN-113603682-A | dicyanomethylene-4H-pyran molecule with AIE effect, construction method and application | 华东理工大学 | 2021-11-05 | — | — | CN | claimed |
| CN-113354655-A | Bibenzo [5,6] spiroketal compound and preparation method thereof | 张家港威胜生物医药有限公司 | 2021-09-07 | — | — | CN | claimed |
| US-9238611-B2 | Process for separating aryl carboxylic acids | RELIANCE INDUSTRIES LIMITED (IN) | 2016-01-19 | — | — | US | claimed |
| US-20150065748-A1 | PROCESS FOR SEPARATING ARYL CARBOXYLIC ACIDS | RELIANCE INDUSTRIES LIMITED (IN) | 2015-03-05 | — | — | US | claimed |
| EP-2831027-A1 | A PROCESS FOR SEPARATING ARYL CARBOXYLIC ACIDS | Reliance Industries Limited (IN) | 2015-02-04 | — | — | EP | claimed |
| WO-2013164852-A1 | A PROCESS FOR SEPARATING ARYL CARBOXYLIC ACIDS | RELIANCE INDUSTRIES LIMITED (IN) | 2013-11-07 | — | — | WO | claimed |
| EP-1963344-A1 | ORGANOPHOSPHORIC DERIVATIVES USEFUL AS ANTI-PARASITIC AGENTS | UNIVERSITEIT GENT (BE) | 2008-09-03 | — | — | EP | claimed |
| WO-2007071453-A1 | ORGANOPHOSPHORIC DERIVATIVES USEFUL AS ANTI-PARASITIC AGENTS | UNIVERSITEIT GENT (BE) | 2007-06-28 | — | — | WO | claimed |
| US-6989052-B1 | Phase change ink printing process | XEROX CORPORATION (US) | 2006-01-24 | — | — | US | claimed |
| US-20060004123-A1 | PHASE CHANGE INK PRINTING PROCESS | XEROX CORPORATION | 2006-01-05 | — | — | US | claimed |
| EP-0070198-B1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMATION METHOD USING THE SAME | Hitachi, Ltd. (JP) | 1985-06-19 | — | — | EP | claimed |
| EP-0070198-A1 | Radiation-sensitive composition and pattern-formation method using the same | Hitachi, Ltd. (JP) | 1983-01-19 | — | — | EP | claimed |