SCHEMBL173143

SCHEMBL173143

CB(C)N(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6436118 0.71
SCHEMBL5063867 0.67
SCHEMBL8966970 0.67
SCHEMBL20376089 0.67
SCHEMBL21562233 0.67
SCHEMBL14872003 0.67
SCHEMBL13708490 0.67
Trimethylammonium SCHEMBL8966195 0.67
SCHEMBL14650920 0.64
SCHEMBL306327 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12365988-B2 Atomic layer deposition and etching of transition metal dichalcogenide thin films ASM IP HOLDING B.V. (NL) 2025-07-22 US disclosed
EP-4393924-A1 IMIDAZO [1,2-A] PYRAZINE OR PYRAZOLO [1,5-A] PYRIMIDINE DERIVATIVE AND USE THEREOF Tencent Technology (Shenzhen) Company Limited (CN) 2024-07-03 EP disclosed
US-20240096711-A1 METHOD FOR FORMING A SEMICONDUCTOR DEVICE STRUCTURE AND RELATED SEMICONDUCTOR DEVICE STRUCTURES ASM IP HOLDING B.V. (NL) 2024-03-21 US disclosed
US-20230250534-A1 ATOMIC LAYER DEPOSITION AND ETCHING OF TRANSITION METAL DICHALCOGENIDE THIN FILMS ASM IP HOLDING B.V. (NL) 2023-08-10 US disclosed
US-11700765-B2 Organic electroluminescent materials and devices UNIVERSAL DISPLAY CORPORATION (US) 2023-07-11 US disclosed
US-20230209849-A1 ORGANIC ELECTROLUMINESCENCE DEVICE COMPRISING A LIGHT EMITTING LAYER COM-PRISING THREE DIFFERENT COMPOUNDS AND AN ELECTRONIC EQUIPMENT COMPRISING SAID ORGANIC ELECTROLUMINESCENCE DEVICE IDEMITSU KOSAN CO., LTD. (JP) 2023-06-29 US disclosed
US-11643728-B2 Atomic layer deposition and etching of transition metal dichalcogenide thin films ASM IP HOLDING B.V. (NL) 2023-05-09 US disclosed
US-20230137925-A1 HETEROCYCLIC COMPOUND AND AN ORGANIC ELECTROLUMINESCENCE DEVICE COMPRISING THE HETEROCYCLIC COMPOUND IDEMITSU KOSAN CO.,LTD (JP) 2023-05-04 US disclosed
US-11525184-B2 Dual selective deposition ASM IP HOLDING B.V. (NL) 2022-12-13 US disclosed
US-10954296-B2 Method of using anti-APRIL (a proliferation-inducing ligand) antibodies to reduce IGA Visterra, Inc. (US) 2021-03-23 US disclosed
EP-1238989-A2 Olefin polymerization catalyst and process for producing olefin polymer with the catalyst Mitsui Chemicals, Inc. (JP) 2002-09-11 EP disclosed
EP-0519496-B1 Thermosetting copolymers, silicon carbide-based fiber and processes for producing same TONEN CORP (JP) 1996-05-22 EP disclosed
EP-0404503-B1 Boron-containing, silicon nitride-based ceramic shaped body production process TONEN CORP (JP) 1996-03-06 EP disclosed
EP-0389084-B1 Process for producing a polyborosilazane TONEN CORP (JP) 1995-09-20 EP disclosed
US-5292830-A Silane, silazane, boron block crosslinked copolymers TONEN CORPORATION (JP) 1994-03-08 US disclosed
EP-0519496-A1 Thermosetting copolymers, silicon carbide-based fiber and processes for producing same Tonen Corporation (JP) 1992-12-23 EP disclosed
US-5128286-A BORON-CONTAINING, SILICON NITRIDE-BASED CERAMIC SHAPED BODY TONEN CORPORATION (JP) 1992-07-07 US disclosed
US-5030744-A Polyborosilazane and process for producing same TONEN CORPORATION (JP) 1991-07-09 US disclosed
EP-0404503-A1 Boron-containing, silicon nitride-based ceramic shaped body production process Tonen Corporation (JP) 1990-12-27 EP disclosed
EP-0389084-A2 Process for producing a polyborosilazane Tonen Corporation (JP) 1990-09-26 EP disclosed