SCHEMBL17330683

SCHEMBL17330683

C=CC(=O)OCC1OCC1(C)C

nearest known ligand 0.38

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.38
HPGD P15428 1/20 0.37
ALDH1A1 P00352 5/20 0.36
TP53 P04637 3/20 0.36
HIF1A Q16665 3/20 0.36
CYP3A4 P08684 2/20 0.36
HSD17B10 Q99714 1/20 0.36
MAPK1 P28482 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
THRB P10828 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28441836 0.84 TSHR (0.42) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL14656294 0.83 TSHR (0.38) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL20505482 0.80 TSHR (0.44) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL28225104 0.77 TSHR (0.41) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL6725888 0.75 TSHR (0.34) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL28200197 0.74 TSHR (0.42) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL28338305 0.73 TSHR (0.44) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL28005080 0.73 TSHR (0.39) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL23494014 0.72 TSHR (0.37) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL28860856 0.72 THRB (0.35) TSHRHPGDALDH1A1TP53HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109212899-B Colored curable resin composition, color filter and display device 住友化学株式会社 2024-06-07 CN disclosed
CN-118020026-A Photosensitive resin composition, cured product, partition wall, organic electroluminescent element, and image display device 三菱化学株式会社 2024-05-10 CN disclosed
CN-117940810-A Photosensitive coloring resin composition, color filter and display device DNP精细化工股份有限公司 2024-04-26 CN disclosed
WO-2024070371-A1 COMPOSITION, OPTICAL FILTER, AND SOLID-STATE IMAGING ELEMENT 住友化学株式会社 2024-04-04 WO disclosed
CN-113444380-B Compound, colorant and colored resin composition 住友化学株式会社 2024-02-20 CN disclosed
CN-117396563-A Compounds of formula (I) 住友化学株式会社 2024-01-12 CN disclosed
CN-113166338-B Colored curable resin composition 住友化学株式会社 2023-12-26 CN disclosed
CN-117255831-A Compounds of formula (I) 住友化学株式会社 2023-12-19 CN disclosed
CN-111132963-B Compound, composition, cured product, and method for producing cured product 株式会社艾迪科 2023-11-24 CN disclosed
CN-108445716-B Curable resin composition, cured film, and display device 住友化学株式会社 2023-09-26 CN disclosed
WO-2020031799-A1 COLORING COMPOSITION 住友化学株式会社 2020-02-13 WO disclosed
CN-104950575-B Radiation-sensitive resin composition, method for forming spacer and interlayer insulating film for display element, and display element JSR株式会社 2020-01-31 CN disclosed
CN-104880908-B Photosensitive resin composition 住友化学株式会社 2019-12-13 CN disclosed
CN-106030407-B Photosensitive resin composition 住友化学株式会社 2019-12-06 CN disclosed
CN-110546134-A Oxime ester compound and photopolymerization initiator containing the same ADEKA CORP 2019-12-06 CN disclosed
WO-2019171998-A1 COLORING CURABLE RESIN COMPOSITION, COLOR FILTER AND DISPLAY DEVICE 住友化学株式会社 2019-09-12 WO disclosed
WO-2019155923-A1 COLORED PHOTOSENSITIVE RESIN COMPOSITION 住友化学株式会社 2019-08-15 WO disclosed
CN-109799680-A Chemical amplification positive photosensitive resin composition and its application 奇美实业股份有限公司 2019-05-24 CN disclosed
US-9488911-B2 Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, method of manufacturing electronic device and electronic device FUJIFILM CORPORATION (JP) 2016-11-08 US disclosed
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-12-17 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE POLQ, POLR1A, POLI TSHR 3172/4885HPGD 4208/4885ALDH1A1 743/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.