Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | CACNA1B | Q00975 | 1/20 | 0.33 |
| ▸ | APBA1 | Q02410 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6559200 | 0.88 | CYP3A4 (0.39) | CYP3A4TSHRMAPTCACNA1BAPBA1 | |
| SCHEMBL1733640 | 0.81 | CYP3A4 (0.35) | CYP3A4TSHRMAPTCACNA1BAPBA1 | |
| SCHEMBL6560524 | 0.76 | NPSR1 (0.41) | CYP3A4TSHRMAPTCACNA1BAPBA1 | |
| SCHEMBL6559153 | 0.73 | NPSR1 (0.53) | MAPTALDH1A1SMN1; SMN2 | |
| SCHEMBL5608170 | 0.72 | POLB (0.41) | MAPTALDH1A1HSD17B10SMN1; SMN2 | |
| SCHEMBL7797331 | 0.72 | ALDH1A1 (0.50) | CYP3A4MAPTALDH1A1 | |
| SCHEMBL9017819 | 0.71 | CYP3A4 (0.39) | CYP3A4TSHRMAPTCACNA1BAPBA1 | |
| SCHEMBL1361994 | 0.70 | CYP3A4 (0.33) | CYP3A4TSHRMAPTCACNA1BAPBA1 | |
| SCHEMBL7196359 | 0.69 | CYP3A4 (0.42) | CYP3A4TSHRMAPTCACNA1BAPBA1 | |
| SCHEMBL9249765 | 0.69 | ALDH1A1 (0.36) | CYP3A4TSHRMAPTCACNA1BAPBA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1443363-B1 | Photoresist composition | DAICEL CHEM (JP) | 2013-07-10 | — | — | EP | disclosed |
| EP-0999474-B1 | Photoresist resin composition and method for forming a pattern | DAICEL CHEM (JP) | 2011-11-23 | — | — | EP | disclosed |
| EP-1443363-A2 | Compounds for photoresist and resin composition for photoresist | Daicel Chemical Industries, Ltd. (JP) | 2004-08-04 | — | — | EP | disclosed |
| US-6391520-B1 | ADAMANTANE COMPOUND OR POLYMER AND PHOTOACID GENERATORS; ETCHING RESISTANCE; SOLUBILIZABLE BY IRRADIATION WITH LIGHT; MINUTE PATTERNS | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-05-21 | — | — | US | disclosed |
| EP-0999474-A1 | COMPOUNDS FOR PHOTORESIST AND RESIN COMPOSITION FOR PHOTORESIST | Daicel Chemical Industries, Ltd. (JP) | 2000-05-10 | — | — | EP | disclosed |