⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11525220 | 0.84 | — | — | |
| SCHEMBL21230083 | 0.74 | — | — | |
| SCHEMBL11213114 | 0.68 | — | — | |
| SCHEMBL11567797 | 0.67 | — | — | |
| SCHEMBL7740461 | 0.64 | — | — | |
| SCHEMBL20696480 | 0.64 | — | — | |
| SCHEMBL7903212 | 0.61 | NOS3 (0.30) | — | |
| SCHEMBL11465864 | 0.59 | — | — | |
| SCHEMBL10745436 | 0.58 | — | — | |
| SCHEMBL4349415 | 0.58 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9242407-B2 | Resin for thermal imprinting | SCIVAX CORPORATION (JP) | 2016-01-26 | — | — | US | disclosed |
| US-20140339735-A1 | RESIN FOR THERMAL IMPRINTING | SCIVAX CORPORATION (JP) | 2014-11-20 | — | — | US | disclosed |
| US-8721950-B2 | Resin for thermal imprint | SCIVAX CORPORATION (JP) | 2014-05-13 | — | — | US | disclosed |
| US-8597769-B2 | Etching mask, base material having etching mask, finely processed article, and method for production of finely processed article | MARUZEN PETROCHEMICAL CO. LTD. (JP) | 2013-12-03 | — | — | US | disclosed |
| US-20130056906-A1 | RESIN FOR THERMAL IMPRINT | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2013-03-07 | — | — | US | disclosed |
| US-8324332-B2 | Resin for thermal imprint | SCIVAX CORPORATION (JP) | 2012-12-04 | — | — | US | disclosed |
| EP-1958970-B1 | USE OF RESINS FOR THERMAL IMPRINTING | SCIVAX CORP (JP) | 2011-11-23 | — | — | EP | disclosed |
| US-20100310830-A1 | Etching Mask, Base Material Having Etching Mask, Finely Processed Article, And Method For Production Of Finely Processed Article | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-12-09 | — | — | US | disclosed |
| EP-2221162-A1 | ETCHING MASK, BASE MATERIAL HAVING ETCHING MASK, FINELY PROCESSED ARTICLE, AND METHOD FOR PRODUCTION OF FINELY PROCESSED ARTICLE | Maruzen Petrochemical CO., LTD. (JP) | 2010-08-25 | — | — | EP | disclosed |
| US-20100189985-A1 | THERMAL-IMPRINTING RESIN, THERMAL-IMPRINTING-RESIN SOLUTION, THERMAL-IMPRINTING INJECTION-MOLDED BODY, THERMAL-IMPRINTING THIN FILM AND PRODUCTION METHOD THEREOF | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-07-29 | — | — | US | disclosed |
| US-20100189984-A1 | THERMAL-IMPRINTING RESIN SOLUTION, THERMAL-IMPRINTING RESIN THIN FILM, AND METHOD OF MANUFACTURING THOSE | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-07-29 | — | — | US | disclosed |
| EP-2163565-A1 | RESIN FOR THERMAL IMPRINTING, RESIN SOLUTION FOR THERMAL IMPRINTING, INJECTION MOLDED BODY FOR THERMAL IMPRINTING, THIN FILM FOR THERMAL IMPRINTING, AND PROCESS FOR PRODUCING THE THIN FILM | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-03-17 | — | — | EP | disclosed |
| US-20100013122-A1 | Resin for Thermal Imprint | SCIVAX CORPORATON (JP) | 2010-01-21 | — | — | US | disclosed |
| EP-1958970-A1 | RESIN FOR THERMAL IMPRINTING | Scivax Corporation (JP) | 2008-08-20 | — | — | EP | disclosed |
| EP-1930349-A1 | RESIN FOR THERMAL IMPRINT | Scivax Corporation (JP) | 2008-06-11 | — | — | EP | disclosed |