SCHEMBL17336283

SCHEMBL17336283

CCC(CN)NC1CCCCC1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.44
EPHX1 P07099 2/20 0.41
SHBG P04278 1/20 0.41
TP53 P04637 1/20 0.39
MAPT P10636 2/20 0.38
BLM P54132 2/20 0.38
GMNN O75496 1/20 0.38
LMNA P02545 1/20 0.38
PMP22 Q01453 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
MEN1 O00255 1/20 0.37
NPC1 O15118 1/20 0.37
ALDH1A1 P00352 1/20 0.37
THRB P10828 1/20 0.37
S100A4 P26447 1/20 0.37
RECQL P46063 1/20 0.37
RAB9A P51151 1/20 0.37
GALK1 P51570 1/20 0.37
CASP6 P55212 1/20 0.37
KMT2A Q03164 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1148861 0.87 KDM4E (0.50) KDM4EEPHX1SHBGMAPTBLM
SCHEMBL7775156 0.87 KDM4E (0.50) KDM4EEPHX1SHBGMAPTBLM
Ammonia Solution, Strong SCHEMBL342936 0.85 KDM4E (0.48) KDM4EEPHX1SHBGMAPTBLM
SCHEMBL7776985 0.84 KDM4E (0.52) KDM4EEPHX1SHBGMAPTBLM
SCHEMBL199581 0.84 SHBG (0.39) KDM4EEPHX1SHBGTP53MAPT
SCHEMBL23375445 0.79 SHBG (0.41) KDM4EEPHX1SHBGMAPTBLM
SCHEMBL14636032 0.79 SHBG (0.41) KDM4EEPHX1SHBGMAPTBLM
SCHEMBL9885785 0.79 SHBG (0.41) KDM4EEPHX1SHBGMAPTBLM
SCHEMBL9810149 0.79 EPHX1 (0.41) KDM4EEPHX1TP53MAPTBLM
SCHEMBL28376038 0.77 KDM4E (0.41) KDM4EEPHX1SHBGMAPTBLM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3154937-B1 CHLORINE-RESISTANT POLYETHYLENE COMPOUND AND ARTICLES MADE THEREFROM FINA TECHNOLOGY (US) 2024-05-22 EP claimed
US-10584823-B2 Chlorine-resistant polyethylene compound and articles made therefrom FINA TECHNOLOGY, INC. (US) 2020-03-10 US claimed
EP-3154937-A1 CHLORINE-RESISTANT POLYETHYLENE COMPOUND AND ARTICLES MADE THEREFROM Fina Technology, Inc. (US) 2017-04-19 EP claimed
US-20170089503-A1 Chlorine-resistant Polyethylene Compound and Articles Made Therefrom TOTAL AMERICAN SERVICES, INC. 2017-03-30 US claimed
WO-2015191721-A1 CHLORINE-RESISTANT POLYETHYLENE COMPOUND AND ARTICLES MADE THEREFROM FINA TECHNOLOGY, INC. (US) 2015-12-17 WO claimed
US-20250161906-A1 METHOD FOR REMOVING GASES EVONIK OPERATIONS GMBH (DE) 2025-05-22 US disclosed
EP-4556101-A1 GAS REMOVAL METHOD Evonik Operations GmbH (DE) 2025-05-21 EP disclosed
EP-3154937-B1 CHLORINE-RESISTANT POLYETHYLENE COMPOUND AND ARTICLES MADE THEREFROM FINA TECHNOLOGY (US) 2024-05-22 EP disclosed
US-10584823-B2 Chlorine-resistant polyethylene compound and articles made therefrom FINA TECHNOLOGY, INC. (US) 2020-03-10 US disclosed
EP-3154937-A1 CHLORINE-RESISTANT POLYETHYLENE COMPOUND AND ARTICLES MADE THEREFROM Fina Technology, Inc. (US) 2017-04-19 EP disclosed
US-20170089503-A1 Chlorine-resistant Polyethylene Compound and Articles Made Therefrom TOTAL AMERICAN SERVICES, INC. 2017-03-30 US disclosed
WO-2015191721-A1 CHLORINE-RESISTANT POLYETHYLENE COMPOUND AND ARTICLES MADE THEREFROM FINA TECHNOLOGY, INC. (US) 2015-12-17 WO disclosed