Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTSD | P07339 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12540834 | 0.80 | CTSD (0.32) | CTSD | |
| SCHEMBL2230540 | 0.73 | CTSD (0.43) | CTSD | |
| SCHEMBL9521221 | 0.69 | — | — | |
| SCHEMBL9516173 | 0.67 | CTSD (0.35) | CTSD | |
| SCHEMBL5616521 | 0.67 | CTSD (0.35) | CTSD | |
| SCHEMBL28961651 | 0.65 | CTSD (0.38) | CTSD | |
| SCHEMBL2174584 | 0.65 | CTSD (0.33) | CTSD | |
| SCHEMBL27812482 | 0.63 | CTSD (0.32) | CTSD | |
| Hydrochloric Acid SCHEMBL9077088 | 0.61 | CTSD (0.31) | CTSD | |
| SCHEMBL25223152 | 0.61 | CTSD (0.35) | CTSD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1443363-B1 | Photoresist composition | DAICEL CHEM (JP) | 2013-07-10 | — | — | EP | disclosed |
| EP-0999474-B1 | Photoresist resin composition and method for forming a pattern | DAICEL CHEM (JP) | 2011-11-23 | — | — | EP | disclosed |
| EP-1445266-B1 | Photoresist copolymer | DAICEL CHEM (JP) | 2006-05-03 | — | — | EP | disclosed |
| EP-0915077-B1 | POLYMERIZABLE ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THE SAME | DAICEL CHEM (JP) | 2004-11-17 | — | — | EP | disclosed |
| EP-1445266-A2 | Photoresist copolymer | Daicel Chemical Industries, Ltd. (JP) | 2004-08-11 | — | — | EP | disclosed |
| EP-1443363-A2 | Compounds for photoresist and resin composition for photoresist | Daicel Chemical Industries, Ltd. (JP) | 2004-08-04 | — | — | EP | disclosed |
| US-20030180662-A1 | Acid-sensitive compound and resin composition for photoresist | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-09-25 | — | — | US | disclosed |
| EP-0926134-B1 | Processes for producing alpha-cyanohydrin esters and alpha-hydroxy acids | DAICEL CHEM (JP) | 2003-09-17 | — | — | EP | disclosed |
| EP-0926135-B1 | Processes for producing alpha-aminonitrile derivatives and alpha-amino acids | DAICEL CHEM (JP) | 2002-06-05 | — | — | EP | disclosed |
| US-6391520-B1 | ADAMANTANE COMPOUND OR POLYMER AND PHOTOACID GENERATORS; ETCHING RESISTANCE; SOLUBILIZABLE BY IRRADIATION WITH LIGHT; MINUTE PATTERNS | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-05-21 | — | — | US | disclosed |
| US-6218569-B1 | CATALYTIC ESTERIFICATION REACTION OF ALICYCLIC ALCOHOL AND UNSATURATED CARBOXYLIC ACID; PHOTOSENSITIVITY | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2001-04-17 | — | — | US | disclosed |
| EP-1070699-A1 | ALICYCLIC COMPOUNDS CONTAINING HYDROXYMETHYL GROUP, PROCESS FOR PRODUCING THE SAME, AND POLYMERIZABLE ALICYCLIC COMPOUND | Daicel Chemical Industries, Ltd. (JP) | 2001-01-24 | — | — | EP | disclosed |
| EP-1057806-A1 | POLYMERIZABLE ALICYCLIC ESTERS AND PROCESS FOR PRODUCING THE SAME | Daicel Chemical Industries, Ltd. (JP) | 2000-12-06 | — | — | EP | disclosed |
| US-6111128-A | IN THE PRESENCE OF A METAL CATALYST, REACTING AN ENOL ESTER OF GIVEN FORMULA OR OXIME ESTER WITH A CARBONYL COMPOUND AND CYANOGENATION AGENT TO FORM AN ALPHA-CYANOHYDRIN ESTER WHICH IS HYDROLYZED TO FORM ALPHA-HYDROXY ACIDS; EFFICIENCY | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2000-08-29 | — | — | US | disclosed |
| US-6100419-A | Processes for producing α-aminonitrile derivatives and α-amino acids | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2000-08-08 | — | — | US | disclosed |
| EP-1000924-A1 | ACID-SENSITIVE COMPOUND AND RESIN COMPOSITION FOR PHOTORESIST | Daichel Chemical Industries Ltd (JP) | 2000-05-17 | — | — | EP | disclosed |
| EP-0999474-A1 | COMPOUNDS FOR PHOTORESIST AND RESIN COMPOSITION FOR PHOTORESIST | Daicel Chemical Industries, Ltd. (JP) | 2000-05-10 | — | — | EP | disclosed |
| EP-0926134-A2 | Processes for producing alpha-cyanohydrin esters and alpha-hydroxy acids | Daicel Chemical Industries, Ltd. (JP) | 1999-06-30 | — | — | EP | disclosed |
| EP-0926135-A2 | Processes for producing alpha-aminonitrile derivatives and alpha-amino acids | Daicel Chemical Industries, Ltd. (JP) | 1999-06-30 | — | — | EP | disclosed |
| EP-0915077-A1 | POLYMERIZABLE ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THE SAME | Daicel Chemical Industries, Ltd. (JP) | 1999-05-12 | — | — | EP | disclosed |