SCHEMBL17359243

SCHEMBL17359243

c1cc(C(c2ccc(OCC3CO3)cc2)c2ccc(C(c3ccc(OCC4CO4)cc3)c3ccc(OC[C@@H]4CO4)cc3)cc2)ccc1OCC1CO1

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.63
ALDH1A1 P00352 4/20 0.59
TP53 P04637 3/20 0.59
TSHR P16473 3/20 0.59
MAPT P10636 2/20 0.59
HPGD P15428 2/20 0.59
HIF1A Q16665 2/20 0.59
MEN1 O00255 2/20 0.59
KMT2A Q03164 2/20 0.59
PKM P14618 2/20 0.59
CYP1A2 P05177 1/20 0.59
PPARG P37231 1/20 0.59
LMNA P02545 1/20 0.59
GAA P10253 1/20 0.59
SMN1; SMN2 Q16637 2/20 0.56
CYP3A4 P08684 1/20 0.56
GLA P06280 1/20 0.44
FGFR1 P11362 1/20 0.40
SRC P12931 1/20 0.40
GRM2 Q14416 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15246778 1.00 TDP1 (0.63) TDP1ALDH1A1TP53TSHRMAPT
SCHEMBL50130 1.00 TDP1 (0.63) TDP1ALDH1A1TP53TSHRMAPT
SCHEMBL14388708 1.00 TDP1 (0.63) TDP1ALDH1A1TP53TSHRMAPT
SCHEMBL17356545 1.00 TDP1 (0.63) TDP1ALDH1A1TP53TSHRMAPT
SCHEMBL10697658 0.93 TDP1 (0.71) TDP1ALDH1A1TP53TSHRMAPT
SCHEMBL17552360 0.93 TDP1 (0.71) TDP1ALDH1A1TP53TSHRMAPT
SCHEMBL15082537 0.92 TDP1 (0.54) TDP1ALDH1A1TP53TSHRMAPT
SCHEMBL17897426 0.92 TDP1 (0.54) TDP1ALDH1A1TP53TSHRMAPT
SCHEMBL22055433 0.92 TDP1 (0.54) TDP1ALDH1A1TP53TSHRMAPT
SCHEMBL17897424 0.92 ALDH1A1 (0.55) TDP1ALDH1A1TP53TSHRMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9557645-B2 Positive photosensitive resin composition, photo-curable dry film and method for producing same, layered product, patterning process, and substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-01-31 US disclosed
US-9377689-B2 Silicone structure-bearing polymer, negative resist composition, photo-curable dry film, patterning process, and electric/electronic part-protecting film SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-28 US disclosed
US-20150370166-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, LAYERED PRODUCT, PATTERNING PROCESS, AND SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-24 US disclosed