SCHEMBL1736356

SCHEMBL1736356

C=C(C)C(N)=O.NCCNCCN

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.57
CA12 O43570 5/20 0.48
CA6 P23280 5/20 0.48
CA7 P43166 5/20 0.48
CA9 Q16790 5/20 0.48
CA14 Q9ULX7 5/20 0.48
CA5B Q9Y2D0 5/20 0.48
MEN1 O00255 2/20 0.48
RECQL P46063 2/20 0.48
KMT2A Q03164 2/20 0.48
CA2 P00918 4/20 0.46
CA4 P22748 4/20 0.46
CA5A P35218 4/20 0.46
CA3 P07451 3/20 0.46
ALOX15 P16050 3/20 0.46
LMNA P02545 2/20 0.46
CA1 P00915 2/20 0.46
ALDH1A1 P00352 1/20 0.46
TP53 P04637 1/20 0.46
PAOX Q6QHF9 3/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL167512 1.00 TDP1 (0.57) TDP1CA12CA6CA7CA9
Trientine SCHEMBL3252613 0.98 TDP1 (0.55) TDP1CA12CA6CA7CA9
Trientine SCHEMBL732582 0.98 TDP1 (0.55) TDP1CA12CA6CA7CA9
Trientine SCHEMBL3254942 0.98 TDP1 (0.55) TDP1CA12CA6CA7CA9
SCHEMBL9061857 0.98 TDP1 (0.55) TDP1CA12CA6CA7CA9
SCHEMBL11298147 0.87 TDP1 (0.43) TDP1CA12CA6CA7CA9
Methacrylic Acid SCHEMBL28773025 0.86 CA12 (0.48) TDP1CA12CA6CA7CA9
Methacrylic Acid SCHEMBL8994666 0.86 CA12 (0.48) TDP1CA12CA6CA7CA9
Acetamide SCHEMBL11164476 0.85 CA12 (0.59) TDP1CA12CA6CA7CA9
Methacrylic Acid SCHEMBL28466957 0.84 CA12 (0.50) TDP1CA12CA6CA7CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 110 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023282046-A1 COMPOUND, COMPOSITION, CURED PRODUCT, AND METHOD FOR MANUFACTURING CURED PRODUCT 株式会社ADEKA 2023-01-12 WO disclosed
WO-2023282045-A1 COMPOUND, COMPOSITION, CURED PRODUCT, AND METHOD FOR PRODUCING CURED PRODUCT 株式会社ADEKA 2023-01-12 WO disclosed
EP-3339331-B1 COMPOSITION ADEKA CORP (JP) 2022-02-16 EP disclosed
EP-3176153-B1 NOVEL POLYMERIZATION INITIATOR AND RADICALLY POLYMERIZABLE COMPOSITION CONTAINING SAME ADEKA CORP (JP) 2020-04-08 EP disclosed
US-10286421-B2 Photosensitive composition, method for producing cured product, cured film, display device, and touch panel FUJIFILM CORPORATION (JP) 2019-05-14 US disclosed
US-10061196-B2 Photosensitive composition, method for producing cured film, cured film, touch panel, and display device FUJIFILM CORPORATION (JP) 2018-08-28 US disclosed
EP-3339331-A1 COMPOSITION Adeka Corporation (JP) 2018-06-27 EP disclosed
US-10005851-B2 Polymerization initiator and radically polymerizable composition containing same ADEKA CORPORATION (JP) 2018-06-26 US disclosed
EP-3176153-A1 NOVEL POLYMERIZATION INITIATOR AND RADICALLY POLYMERIZABLE COMPOSITION CONTAINING SAME Adeka Corporation (JP) 2017-06-07 EP disclosed
US-20170153544-A1 PHOTOSENSITIVE COMPOSITION, METHOD FOR PRODUCING CURED FILM, CURED FILM, TOUCH PANEL, AND DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2017-06-01 US disclosed
EP-0272572-A1 Method for improving durability of mirrors utilizing radiation curable coatings PPG INDUSTRIES, INC. (US) 1988-06-29 EP disclosed
US-4745003-A REFLECTIVE LAYER OF METAL ADHESION TO GLASS, PROTECTIVE COATINGS PPG INDUSTRIES, INC. (US) 1988-05-17 US disclosed
EP-0261910-A2 Water-developable photosensitive plate and its production Nippon Paint Co., Ltd. (JP) 1988-03-30 EP disclosed
WO-1988002135-A1 WATER-DEVELOPABLE PHOTOSENSITIVE PLATE AND ITS PRODUCTION NAPP SYSTEMS (USA), INC. (US) 1988-03-24 WO disclosed
US-4649082-A PROTECITVE COATINGS FOR METALS AND METALLIZED PLASTICS; PERFUME CONTAINERS AND CAPS PPG INDUSTRIES, INC. (US) 1987-03-10 US disclosed
EP-0193958-A2 Radiation curable compositions based on radiation curable esters of polyfunctional hydroxyl-containing carboxylic acids PPG INDUSTRIES, INC. (US) 1986-09-10 EP disclosed
US-4268611-A Contact photographic process for producing a planographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 1981-05-19 US disclosed
US-4238560-A Photosensitive printing plate forming material having a novel matting layer composition FUJI PHOTO FILM CO., LTD. (JP) 1980-12-09 US disclosed
US-4168979-A Light-sensitive printing plate with matt overlayer FUJI PHOTO FILM CO., LTD. (JP) 1979-09-25 US disclosed
US-4167415-A Photocurable composition comprising copolymer of maleic acid monoester and α-olefin compound KANSAI PAINT CO., LTD. (JP) 1979-09-11 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10005851-B2 Polymerization initiator and radically polymerizable composition containing same CYBA, CCNT1, SPTBN1 TDP1 1745/4885CA12 4590/4885CA6 4403/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.