⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10877644 | 0.72 | — | — | |
| SCHEMBL31189252 | 0.70 | — | — | |
| SCHEMBL480211 | 0.69 | — | — | |
| SCHEMBL8912579 | 0.64 | — | — | |
| SCHEMBL3625903 | 0.64 | — | — | |
| SCHEMBL959080 | 0.58 | — | — | |
| SCHEMBL514101 | 0.58 | — | — | |
| SCHEMBL10798475 | 0.55 | — | — | |
| SCHEMBL8423148 | 0.51 | — | — | |
| SCHEMBL718700 | 0.51 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 75 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260130139-A1 | LOW TEMPERATURE SI-CONTAINING FILMS DEPOSITED FROM CHLOROSILANE AND AMINOSILANE REACTIONS | VERSUM MAT US LLC (US) | 2026-05-07 | — | — | US | claimed |
| WO-2025226985-A1 | PASSIVATION OF POLYSILICON MATERIAL AND SELECTIVE DEPOSITION OF DIELECTRIC MATERIAL UTILIZING ALKYNES | VERSUM MATERIALS US, LLC (US) | 2025-10-30 | — | — | WO | claimed |
| CN-119954160-A | Tetrachlorodisiloxane method for synthesizing alkane | 内蒙古大全半导体有限公司 | 2025-05-09 | — | — | CN | claimed |
| WO-2025080587-A2 | SILICON-CONTAINING FILMS HAVING SURFACES MODIFIED FROM HALOGENATED SILICON-CONTAINING COMPOUNDS | VERSUM MATERIALS US, LLC (US) | 2025-04-17 | — | — | WO | claimed |
| WO-2025076009-A1 | SELECTIVE DEPOSITION OF SILICON CONTAINING FILMS UTILIZING ORGANOAMINOPOLYSILOXANES AND ORGANOAMINOPOLYSILAZANES | VERSUM MATERIALS US, LLC (US) | 2025-04-10 | — | — | WO | claimed |
| WO-2024081357-A1 | LOW TEMPERATURE SI-CONTAINING FILMS DEPOSITED FROM CHLOROSILANE AND AMINOSILANE REACTIONS | VERSUM MATERIALS US, LLC (US) | 2024-04-18 | — | — | WO | claimed |
| CN-116986597-A | Method for preparing chlorosilane by catalytic pyrolysis of polychlorosiloxane | 新特能源股份有限公司 | 2023-11-03 | — | — | CN | claimed |
| WO-2023207848-A1 | METHOD FOR PREPARING CHLOROSILANE BY MEANS OF CATALYTIC CRACKING OF POLYCHLOROSILOXANE | 新特能源股份有限公司 | 2023-11-02 | — | — | WO | claimed |
| US-20140170858-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM | HITACHI KOKUSAI ELECTRIC INC. (JP) | 2014-06-19 | — | — | US | claimed |
| US-20110250116-A1 | Process for Producing Trichlorosilane and Tetrachlorosilane | HEMLOCK SEMICONDUCTOR CORPORATION | 2011-10-13 | — | — | US | claimed |
| EP-2367832-A1 | PROCESS FOR PRODUCING TRICHLOROSILANE AND TETRACHLOROSILANE | Dow Corning Corporation (US) | 2011-09-28 | — | — | EP | claimed |
| US-7943531-B2 | Methods for forming a silicon oxide layer over a substrate | APPLIED MATERIALS, INC. (US) | 2011-05-17 | — | — | US | claimed |
| WO-2010065287-A1 | PROCESS FOR PRODUCING TRICHLOROSILANE AND TETRACHLOROSILANE | DOW CORNING CORPORATION (US) | 2010-06-10 | — | — | WO | claimed |
| EP-0054650-B1 | METHOD OF PURIFYING CHLOROSILANES | HÜLS TROISDORF AKTIENGESELLSCHAFT (DE) | 1986-01-29 | — | — | EP | claimed |
| US-20260130139-A1 | LOW TEMPERATURE SI-CONTAINING FILMS DEPOSITED FROM CHLOROSILANE AND AMINOSILANE REACTIONS | VERSUM MAT US LLC (US) | 2026-05-07 | — | — | US | disclosed |
| WO-2025226985-A1 | PASSIVATION OF POLYSILICON MATERIAL AND SELECTIVE DEPOSITION OF DIELECTRIC MATERIAL UTILIZING ALKYNES | VERSUM MATERIALS US, LLC (US) | 2025-10-30 | — | — | WO | disclosed |
| CN-222885515-U | Polysiloxane efficient separation system in polysilicon system | 弘元能源科技(包头)有限公司 | 2025-05-20 | — | — | CN | disclosed |
| US-20050113592-A1 | Method for preparing chlorosilane | GE BAYER SILICONES GMBH & CO. (DE) | 2005-05-26 | — | — | US | disclosed |
| EP-0054650-B1 | METHOD OF PURIFYING CHLOROSILANES | HÜLS TROISDORF AKTIENGESELLSCHAFT (DE) | 1986-01-29 | — | — | EP | disclosed |
| EP-0054650-A1 | Method of purifying chlorosilanes | HÜLS TROISDORF AKTIENGESELLSCHAFT (DE) | 1982-06-30 | — | — | EP | disclosed |