SCHEMBL17399692

SCHEMBL17399692

O=S(=O)(O)c1cc(F)c(O)c(F)c1F

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 2/20 0.36
ALDH1A1 P00352 1/20 0.36
CASP1 P29466 1/20 0.36
CASP7 P55210 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
ING2 Q9H160 1/20 0.34
PGAM1 P18669 1/20 0.34
TET2 Q6N021 1/20 0.34
COMT P21964 4/20 0.33
ERN1 O75460 1/20 0.33
CA12 O43570 1/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
CA7 P43166 1/20 0.32
CA13 Q8N1Q1 1/20 0.32
MPL P40238 2/20 0.32
NQO1 P15559 1/20 0.32
BRD4 O60885 1/20 0.32
LMNA P02545 1/20 0.31
HPGD P15428 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29571087 0.81 CA1 (0.39) TET2CA12CA1CA2CA7
SCHEMBL4453156 0.81 CA1 (0.39) TET2CA12CA1CA2CA7
SCHEMBL7529411 0.76 HDAC1 (0.35) HSD17B10ALDH1A1TDP1TET2CA12
SCHEMBL6760303 0.73 SLC1A3 (0.41) HSD17B10ALDH1A1CASP1CASP7TDP1
SCHEMBL4968560 0.73 HSD17B10 (0.40) HSD17B10ALDH1A1CASP1CASP7TDP1
Hydrochloric Acid SCHEMBL27910904 0.71 SLC1A3 (0.40) HSD17B10ALDH1A1CASP1CASP7TDP1
SCHEMBL4965801 0.70 TET2 (0.34) HSD17B10ALDH1A1CASP1CASP7TDP1
SCHEMBL3712172 0.70 CES2 (0.43) HSD17B10ALDH1A1TET2CA12CA1
SCHEMBL17351796 0.70 CES2 (0.46) TET2ERN1CA12CA1CA2
SCHEMBL29351017 0.70 CES2 (0.43) HSD17B10ALDH1A1TET2CA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1536285-B1 Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition FUJIFILM CORP (JP) 2016-01-06 EP disclosed