Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRM2 | P08172 | 1/20 | 0.32 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.32 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.32 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.32 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.32 |
| ▸ | HTR3A | P46098 | 1/20 | 0.32 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16787975 | 0.91 | CHRM2 (0.35) | CHRM2CHRM1CHRM3ADRA1ACHRNA4 | |
| SCHEMBL21020801 | 0.86 | CHRM2 (0.37) | CHRM2CHRM1CHRM3ADRA1ACHRNA4 | |
| SCHEMBL18253401 | 0.81 | CHRM2 (0.35) | CHRM2CHRM1CHRM3ADRA1ACHRNA4 | |
| SCHEMBL17853734 | 0.80 | CHRM2 (0.34) | CHRM2CHRM1CHRM3ADRA1ACHRNA4 | |
| SCHEMBL19245716 | 0.79 | CHRM2 (0.33) | CHRM2CHRM1CHRM3ADRA1ACHRNA4 | |
| SCHEMBL9945784 | 0.78 | APOBEC3A (0.46) | KCNH2SMN1; SMN2 | |
| SCHEMBL18253399 | 0.77 | CHRM2 (0.34) | CHRM2CHRM1CHRM3ADRA1ACHRNA4 | |
| SCHEMBL17853744 | 0.76 | CHRM2 (0.33) | CHRM2CHRM1CHRM3ADRA1ACHRNA4 | |
| SCHEMBL16273468 | 0.76 | HMGCR (0.30) | — | |
| SCHEMBL17515456 | 0.76 | MEN1 (0.34) | SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9551931-B2 | Method of forming pattern, actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, process for manufacturing electronic device and electronic device | FUJIFILM CORPORATION (JP) | 2017-01-24 | — | — | US | disclosed |
| US-20160041465-A1 | PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-02-11 | — | — | US | disclosed |
| US-20160004157-A1 | METHOD OF FORMING PATTERN, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, PROCESS FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-01-07 | — | — | US | disclosed |