⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14633823 | 0.82 | ANPEP (0.38) | — | |
| SCHEMBL11664771 | 0.80 | — | — | |
| SCHEMBL28173971 | 0.79 | HRH3 (0.34) | — | |
| SCHEMBL1275649 | 0.79 | ALDH1A1 (0.36) | — | |
| SCHEMBL30758045 | 0.78 | MEN1 (0.33) | — | |
| SCHEMBL21548242 | 0.78 | ANPEP (0.46) | — | |
| SCHEMBL27412238 | 0.78 | — | — | |
| SCHEMBL27756530 | 0.77 | — | — | |
| SCHEMBL23154833 | 0.76 | TSHR (0.46) | — | |
| SCHEMBL14715943 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120077513-A | Adhesive emulsion and preparation method thereof, coating slurry, lithium ion battery diaphragm and preparation method thereof | 深圳市星源材质科技股份有限公司 | 2025-05-30 | — | — | CN | claimed |
| CN-119410206-A | Composite chlorinated resin composition, anticorrosive paint and preparation method thereof | 瑞易德新材料股份有限公司 | 2025-02-11 | — | — | CN | claimed |
| WO-2024113357-A1 | BINDER EMULSION AND PREPARATION METHOD THEREFOR, COATING SLURRY, AND LITHIUM-ION BATTERY SEPARATOR AND PREPARATION METHOD THEREFOR | 深圳市星源材质科技股份有限公司 | 2024-06-06 | — | — | WO | claimed |
| US-11322701-B2 | High dielectric constant composite material and application thereof | PEKING UNIVERSITY SHENZHEN GRADUATE SCHOOL (CN) | 2022-05-03 | — | — | US | claimed |
| CN-109627943-B | Multifunctional coating suitable for battery box and preparation method and application thereof | 苏州烯时代材料科技有限公司 | 2021-02-19 | — | — | CN | claimed |
| CN-108191307-B | Anti-drop graphene stone-like paint and preparation method thereof | 厦门市固力克节能科技有限公司 | 2020-10-09 | — | — | CN | claimed |
| CN-109148685-B | Composite material with high dielectric constant and application thereof | 北京大学深圳研究生院 | 2020-07-24 | — | — | CN | claimed |
| US-20200106034-A1 | HIGH DIELECTRIC CONSTANT COMPOSITE MATERIAL AND APPLICATION THEREOF | PEKING UNIVERSITY SHENZHEN GRADUATE SCHOOL (CN) | 2020-04-02 | — | — | US | claimed |
| CN-105970671-A | Dyeing and coating integrated dye dyeing and printing paste-shaped compound and application thereof | 沈阳化工研究院有限公司 | 2016-09-28 | — | — | CN | claimed |
| EP-2389612-A1 | A PHOTORESIST IMAGE-FORMING PROCESS USING DOUBLE PATTERNING | AZ Electronic Materials USA Corp. (US) | 2011-11-30 | — | — | EP | claimed |
| WO-2010084372-A1 | A PHOTORESIST IMAGE-FORMING PROCESS USING DOUBLE PATTERNING | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-07-29 | — | — | WO | claimed |
| US-20100183851-A1 | Photoresist Image-forming Process Using Double Patterning | CAO YI | 2010-07-22 | — | — | US | claimed |
| CN-120077513-A | Adhesive emulsion and preparation method thereof, coating slurry, lithium ion battery diaphragm and preparation method thereof | 深圳市星源材质科技股份有限公司 | 2025-05-30 | — | — | CN | disclosed |
| CN-119019876-A | Natural color Bei Pian real stone paint and preparation method thereof | 浙江建工装饰材料有限公司 | 2024-11-26 | — | — | CN | disclosed |
| WO-2024113357-A1 | BINDER EMULSION AND PREPARATION METHOD THEREFOR, COATING SLURRY, AND LITHIUM-ION BATTERY SEPARATOR AND PREPARATION METHOD THEREFOR | 深圳市星源材质科技股份有限公司 | 2024-06-06 | — | — | WO | disclosed |
| US-11322701-B2 | High dielectric constant composite material and application thereof | PEKING UNIVERSITY SHENZHEN GRADUATE SCHOOL (CN) | 2022-05-03 | — | — | US | disclosed |
| WO-2010084372-A1 | A PHOTORESIST IMAGE-FORMING PROCESS USING DOUBLE PATTERNING | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-07-29 | — | — | WO | disclosed |
| US-20100183851-A1 | Photoresist Image-forming Process Using Double Patterning | CAO YI | 2010-07-22 | — | — | US | disclosed |
| US-20100119717-A1 | WATER-SOLUBLE RESIN COMPOSITION FOR THE FORMATION OF MICROPATTERNS AND METHOD FOR THE FORMATION OF MICROPATTERNS WITH THE SAME | HONG SUNG-EUN | 2010-05-13 | — | — | US | disclosed |
| EP-2146250-A1 | WATER-SOLUBLE RESIN COMPOSITION FOR THE FORMATION OF MICROPATTERNS AND PROCESS FOR THE FORMATION OF MICROPATTERNS WITH THE SAME | AZ Electronic Materials (Japan) K.K. (JP) | 2010-01-20 | — | — | EP | disclosed |