Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.33 |
| ▸ | CNR1 | P21554 | 1/20 | 0.33 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | ABCC3 | O15438 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.30 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1741198 | 0.80 | TSHR (0.39) | TSHRLMNAKDM4ECNR1ADRA1A | |
| SCHEMBL331674 | 0.79 | TP53 (0.37) | LMNAKDM4ECNR1ADRA1ATDP1 | |
| SCHEMBL1740523 | 0.77 | TSHR (0.35) | TSHRKDM4EALDH1A1CYP1A2CYP2D6 | |
| Diisopropanolamine SCHEMBL10618901 | 0.75 | — | — | |
| Diisopropanolamine SCHEMBL22774 | 0.75 | — | — | |
| SCHEMBL1741392 | 0.74 | LMNA (0.43) | LMNAKDM4ECNR1ADRA1ATDP1 | |
| SCHEMBL7207274 | 0.74 | TSHR (0.47) | TSHRLMNAKDM4ECNR1ADRA1A | |
| SCHEMBL167366 | 0.73 | — | — | |
| SCHEMBL468958 | 0.73 | — | — | |
| SCHEMBL2014569 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2389612-A1 | A PHOTORESIST IMAGE-FORMING PROCESS USING DOUBLE PATTERNING | AZ Electronic Materials USA Corp. (US) | 2011-11-30 | — | — | EP | claimed |
| WO-2010084372-A1 | A PHOTORESIST IMAGE-FORMING PROCESS USING DOUBLE PATTERNING | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-07-29 | — | — | WO | claimed |
| US-20100183851-A1 | Photoresist Image-forming Process Using Double Patterning | CAO YI | 2010-07-22 | — | — | US | claimed |
| EP-2146250-B1 | WATER-SOLUBLE RESIN COMPOSITION FOR THE FORMATION OF MICROPATTERNS AND PROCESS FOR THE FORMATION OF MICROPATTERNS WITH THE SAME | MERCK PATENT GMBH (DE) | 2017-08-23 | — | — | EP | disclosed |
| EP-2389612-A1 | A PHOTORESIST IMAGE-FORMING PROCESS USING DOUBLE PATTERNING | AZ Electronic Materials USA Corp. (US) | 2011-11-30 | — | — | EP | disclosed |
| WO-2010084372-A1 | A PHOTORESIST IMAGE-FORMING PROCESS USING DOUBLE PATTERNING | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-07-29 | — | — | WO | disclosed |
| US-20100183851-A1 | Photoresist Image-forming Process Using Double Patterning | CAO YI | 2010-07-22 | — | — | US | disclosed |
| US-20100119717-A1 | WATER-SOLUBLE RESIN COMPOSITION FOR THE FORMATION OF MICROPATTERNS AND METHOD FOR THE FORMATION OF MICROPATTERNS WITH THE SAME | HONG SUNG-EUN | 2010-05-13 | — | — | US | disclosed |
| EP-2146250-A1 | WATER-SOLUBLE RESIN COMPOSITION FOR THE FORMATION OF MICROPATTERNS AND PROCESS FOR THE FORMATION OF MICROPATTERNS WITH THE SAME | AZ Electronic Materials (Japan) K.K. (JP) | 2010-01-20 | — | — | EP | disclosed |