Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.40 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17475541 | 0.82 | — | — | |
| SCHEMBL8352086 | 0.77 | CYP1A2 (0.43) | CYP1A2CYP2D6CYP2C19 | |
| SCHEMBL18553329 | 0.77 | CYP1A2 (0.43) | CYP1A2CYP2D6CYP2C19 | |
| SCHEMBL27021173 | 0.75 | CYP1A2 (0.42) | CYP1A2CYP2D6CYP2C19 | |
| SCHEMBL13339787 | 0.73 | CYP1A2 (0.41) | CYP1A2CYP2D6CYP2C19 | |
| SCHEMBL27730766 | 0.73 | CYP1A2 (0.41) | CYP1A2CYP2D6CYP2C19 | |
| SCHEMBL3844653 | 0.72 | — | — | |
| SCHEMBL26688048 | 0.71 | CYP1A2 (0.43) | CYP1A2CYP2D6CYP2C19 | |
| SCHEMBL18149037 | 0.71 | CYP1A2 (0.40) | CYP1A2CYP2D6CYP2C19 | |
| SCHEMBL18553330 | 0.66 | CYP1A2 (0.39) | CYP1A2CYP2D6CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118307410-A | Preparation method of chiral secondary alcohol compound | 武汉大学 | 2024-07-09 | — | — | CN | claimed |
| CN-112403470-B | Catalyst for preparing synthetic gas by reforming methane and carbon dioxide and application thereof | 陕西榆大科技发展有限公司 | 2023-07-14 | — | — | CN | claimed |
| CN-112403470-A | Catalyst for preparing synthesis gas by reforming methane and carbon dioxide and application thereof | 榆林学院 | 2021-02-26 | — | — | CN | claimed |
| CN-119661378-A | Preparation method of metal organic complex | 江苏欣诺科催化剂股份有限公司 | 2025-03-21 | — | — | CN | disclosed |
| CN-119101886-A | Method for regulating hydrophilicity of metal oxide film, composite film and application | 江苏微导纳米科技股份有限公司 | 2024-12-10 | — | — | CN | disclosed |
| CN-118870840-B | Mesoporous solar cell and preparation method thereof | 旗滨新能源发展(深圳)有限责任公司 | 2024-11-22 | — | — | CN | disclosed |
| CN-118870840-A | Mesoporous solar cell and preparation method thereof | 旗滨新能源发展(深圳)有限责任公司 | 2024-10-29 | — | — | CN | disclosed |
| CN-118496107-B | Organic small molecule inhibitor and application method thereof in thin film deposition | 合肥安德科铭半导体科技有限公司 | 2024-10-29 | — | — | CN | disclosed |
| CN-118613073-A | Perovskite solar cell and crystalline silicon-perovskite laminated cell | 中国科学技术大学 | 2024-09-06 | — | — | CN | disclosed |
| CN-118496107-A | Organic small molecule inhibitor and application method thereof in thin film deposition | 合肥安德科铭半导体科技有限公司 | 2024-08-16 | — | — | CN | disclosed |
| CN-118307410-A | Preparation method of chiral secondary alcohol compound | 武汉大学 | 2024-07-09 | — | — | CN | disclosed |
| US-8871628-B2 | Electrode structure, device comprising the same and method for forming electrode structure | VEECO ALD INC. (US) | 2014-10-28 | — | — | US | disclosed |
| EP-2389689-B1 | ELECTRODE STRUCTURE, DEVICE COMPRISING THE SAME AND METHOD FOR FORMING ELECTRODE STRUCTURE | VEECO ALD INC (US) | 2014-10-01 | — | — | EP | disclosed |
| US-20130089678-A1 | PLASMA-ENHANCED DEPOSITION OF NICKEL-CONTAINING FILMS FOR VARIOUS APPLICATIONS USING AMIDINATE NICKEL PRECURSORS | AMERICAN AIR LIQUIDE, INC. (US) | 2013-04-11 | — | — | US | disclosed |
| EP-1871781-B1 | VOLATILE NICKEL AMINOALKOXIDE COMPLEX AND DEPOSITION OF NICKEL THIN FILM USING SAME | KOREA RES INST CHEM TECH (KR) | 2012-10-31 | — | — | EP | disclosed |
| EP-2389689-A2 | ELECTRODE STRUCTURE, DEVICE COMPRISING THE SAME AND METHOD FOR FORMING ELECTRODE STRUCTURE | Synos Technology, Inc. (US) | 2011-11-30 | — | — | EP | disclosed |
| US-8038511-B2 | Method for machining chamfer portion of semiconductor wafer and method for correcting groove shape of grinding stone | SHIN-ETSU HANDOTAI CO., LTD. (JP) | 2011-10-18 | — | — | US | disclosed |
| WO-2010085081-A2 | ELECTRODE STRUCTURE, DEVICE COMPRISING THE SAME AND METHOD FOR FORMING ELECTRODE STRUCTURE | SYNOS TECHNOLOGY, INC. (US) | 2010-07-29 | — | — | WO | disclosed |
| US-20100181566-A1 | Electrode Structure, Device Comprising the Same and Method for Forming Electrode Structure | SYNOS TECHNOLOGY, INC. (US) | 2010-07-22 | — | — | US | disclosed |
| US-20100006145-A1 | SOLAR CELL AND FABRICATING METHOD FOR THE SAME | SYNOS TECHNOLOGY, INC. (US) | 2010-01-14 | — | — | US | disclosed |