⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16848449 | 0.73 | — | — | |
| SCHEMBL1741582 | 0.72 | CYP1A2 (0.40) | — | |
| SCHEMBL31602189 | 0.71 | — | — | |
| SCHEMBL11179910 | 0.71 | — | — | |
| SCHEMBL23926865 | 0.69 | — | — | |
| SCHEMBL11331451 | 0.69 | — | — | |
| SCHEMBL27974681 | 0.69 | — | — | |
| SCHEMBL23729542 | 0.69 | — | — | |
| SCHEMBL2845756 | 0.69 | — | — | |
| Hydrochloric Acid SCHEMBL11149403 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250361606-A1 | METAL-FLUORIDE THIN FILMS AND DEPOSITION METHODS | LOTUS APPLIED TECH LLC (US) | 2025-11-27 | — | — | US | disclosed |
| CN-119661378-A | Preparation method of metal organic complex | 江苏欣诺科催化剂股份有限公司 | 2025-03-21 | — | — | CN | disclosed |
| EP-1871781-B1 | VOLATILE NICKEL AMINOALKOXIDE COMPLEX AND DEPOSITION OF NICKEL THIN FILM USING SAME | KOREA RES INST CHEM TECH (KR) | 2012-10-31 | — | — | EP | disclosed |
| EP-1871781-A4 | VOLATILE NICKEL AMINOALKOXIDE COMPLEX AND DEPOSITION OF NICKEL THIN FILM USING SAME | KOREA RES INST CHEM TECH (KR) | 2009-08-12 | — | — | EP | disclosed |
| EP-1871781-A1 | VOLATILE NICKEL AMINOALKOXIDE COMPLEX AND DEPOSITION OF NICKEL THIN FILM USING SAME | Korea Research Institute of Chemical Technology (KR) | 2008-01-02 | — | — | EP | disclosed |
| WO-2006107121-A1 | VOLATILE NICKEL AMINOALKOXIDE COMPLEX AND DEPOSITION OF NICKEL THIN FILM USING SAME | KOREA RESEARCH INSTITUE OF CHEMICAL TECHNOLOGY (KR) | 2006-10-12 | — | — | WO | disclosed |