⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8830235 | 0.89 | ALDH1A1 (0.46) | — | |
| SCHEMBL787775 | 0.80 | — | — | |
| SCHEMBL947173 | 0.75 | — | — | |
| SCHEMBL2387042 | 0.75 | — | — | |
| SCHEMBL26969361 | 0.75 | ALDH1A1 (0.56) | — | |
| SCHEMBL1720080 | 0.75 | — | — | |
| SCHEMBL331164 | 0.75 | — | — | |
| SCHEMBL8487076 | 0.75 | ALDH1A1 (0.42) | — | |
| SCHEMBL31175614 | 0.75 | ALDH1A1 (0.42) | — | |
| SCHEMBL8419549 | 0.75 | ALDH1A1 (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 179 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122010458-A | High-doping phosphogypsum curing agent and application thereof | 湖北省路桥集团有限公司 | 2026-05-12 | — | — | CN | claimed |
| CN-118084390-A | Waterproof agent and preparation method thereof | 中化二建集团有限公司 | 2024-05-28 | — | — | CN | claimed |
| US-8026035-B2 | Organosilicon polymer containing chromogen; antireflactivity coating for lithography | CHEIL INDUSTRIES, INC. (KR) | 2011-09-27 | — | — | US | claimed |
| US-20080241748-A1 | Etch-resistant disilane and saturated hydrocarbon bridged silicon-containing polymers, method of making the same, and method of using the same | CHEIL INDUSTRIES, INC. (KR) | 2008-10-02 | — | — | US | claimed |
| EP-0867440-B1 | Method for treating silane-containing gas | SHINETSU CHEMICAL CO (JP) | 2002-09-11 | — | — | EP | claimed |
| US-5961695-A | Method for treating silane-containing gas | SHIN-ETSU CHEMICAL COL., LTD. (JP) | 1999-10-05 | — | — | US | claimed |
| EP-0867440-A2 | Method for treating silane-containing gas | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1998-09-30 | — | — | EP | claimed |
| EP-0166638-B1 | PROCESS FOR THE PREPARATION OF ORGANOSILANES AND ORGANOPOLYSILANES FROM ORGANODISILANES | RHONE-POULENC CHIMIE (FR) | 1988-08-31 | — | — | EP | claimed |
| EP-0166638-A1 | Process for the preparation of organosilanes and organopolysilanes from organodisilanes | RHONE-POULENC CHIMIE (FR) | 1986-01-02 | — | — | EP | claimed |
| EP-0043480-B1 | PROCESS FOR FORMING METALLIC IMAGES | Hitachi, Ltd. (JP) | 1985-04-03 | — | — | EP | claimed |
| US-4395460-A | Preparation of polysilazane polymers and the polymers therefrom | DOW CORNING CORPORATION (US) | 1983-07-26 | — | — | US | claimed |
| US-4347304-A | PHOTOSENSITIZATION WITH DISILANES OR ORGANIC COMPOUNDS HAVING COUPLED GERMANIUM OR TIN MOLECULES; PHOTORESISTS; POSITIVES; PLATING | HITACHI, LTD. (JP) | 1982-08-31 | — | — | US | claimed |
| EP-0043480-A2 | Process for forming metallic images | Hitachi, Ltd. (JP) | 1982-01-13 | — | — | EP | claimed |
| JP-5310942-A | — | — | None | — | — | JP | disclosed |
| JP-63238089-A | — | — | None | — | — | JP | disclosed |
| CN-122010458-A | High-doping phosphogypsum curing agent and application thereof | 湖北省路桥集团有限公司 | 2026-05-12 | — | — | CN | disclosed |
| EP-0043480-A2 | Process for forming metallic images | Hitachi, Ltd. (JP) | 1982-01-13 | — | — | EP | disclosed |
| US-4289890-A | Synthesis of chloromethyldisilanes | GORDON ROY G | 1981-09-15 | — | — | US | disclosed |
| US-4128606-A | Impact-resistant chemically blended propylene polymer composition and process for preparation thereof | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1978-12-05 | — | — | US | disclosed |
| US-4059608-A | NICKEL CATALYST | RHONE-POULENC INDUSTRIES (FR) | 1977-11-22 | — | — | US | disclosed |