⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1742781 | 0.78 | — | — | |
| SCHEMBL1805609 | 0.75 | — | — | |
| Monoethanolamine SCHEMBL10839687 | 0.74 | TSHR (0.38) | — | |
| SCHEMBL6830457 | 0.74 | — | — | |
| SCHEMBL10269497 | 0.73 | — | — | |
| SCHEMBL159108 | 0.73 | — | — | |
| SCHEMBL5172421 | 0.73 | — | — | |
| SCHEMBL4683342 | 0.73 | — | — | |
| SCHEMBL16549769 | 0.72 | — | — | |
| SCHEMBL1740524 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102272675-A | A photoresist image-forming process using double patterning | — | 2011-12-07 | — | — | CN | claimed |
| EP-2389612-A1 | A PHOTORESIST IMAGE-FORMING PROCESS USING DOUBLE PATTERNING | AZ Electronic Materials USA Corp. (US) | 2011-11-30 | — | — | EP | claimed |
| WO-2010084372-A1 | A PHOTORESIST IMAGE-FORMING PROCESS USING DOUBLE PATTERNING | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-07-29 | — | — | WO | claimed |
| US-20100183851-A1 | Photoresist Image-forming Process Using Double Patterning | CAO YI | 2010-07-22 | — | — | US | claimed |
| EP-2146250-B1 | WATER-SOLUBLE RESIN COMPOSITION FOR THE FORMATION OF MICROPATTERNS AND PROCESS FOR THE FORMATION OF MICROPATTERNS WITH THE SAME | MERCK PATENT GMBH (DE) | 2017-08-23 | — | — | EP | disclosed |
| CN-101675390-B | Water-soluble resin composition for the formation of micropatterns and process for the formation of micropatterns with the same | AZ ELECTRONIC MATERIALS JAPAN | 2012-07-18 | — | — | CN | disclosed |
| CN-102272675-A | A photoresist image-forming process using double patterning | — | 2011-12-07 | — | — | CN | disclosed |
| EP-2389612-A1 | A PHOTORESIST IMAGE-FORMING PROCESS USING DOUBLE PATTERNING | AZ Electronic Materials USA Corp. (US) | 2011-11-30 | — | — | EP | disclosed |
| WO-2010084372-A1 | A PHOTORESIST IMAGE-FORMING PROCESS USING DOUBLE PATTERNING | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-07-29 | — | — | WO | disclosed |
| US-20100183851-A1 | Photoresist Image-forming Process Using Double Patterning | CAO YI | 2010-07-22 | — | — | US | disclosed |
| US-20100119717-A1 | WATER-SOLUBLE RESIN COMPOSITION FOR THE FORMATION OF MICROPATTERNS AND METHOD FOR THE FORMATION OF MICROPATTERNS WITH THE SAME | HONG SUNG-EUN | 2010-05-13 | — | — | US | disclosed |
| CN-101675390-A | Water-soluble resin composition for the formation of micropatterns and process for the formation of micropatterns with the same | AZ ELECTRONIC MATERIALS JAPAN | 2010-03-17 | — | — | CN | disclosed |
| EP-2146250-A1 | WATER-SOLUBLE RESIN COMPOSITION FOR THE FORMATION OF MICROPATTERNS AND PROCESS FOR THE FORMATION OF MICROPATTERNS WITH THE SAME | AZ Electronic Materials (Japan) K.K. (JP) | 2010-01-20 | — | — | EP | disclosed |