SCHEMBL159108

SCHEMBL159108

CCNC(C)CO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4683342 1.00
SCHEMBL10269497 1.00
SCHEMBL1741259 0.89 SIGMAR1 (0.34)
SCHEMBL1743059 0.78 LMNA (0.43)
SCHEMBL1805609 0.78
SCHEMBL15904155 0.77
SCHEMBL14712859 0.77
SCHEMBL1720055 0.77
SCHEMBL12776508 0.77
SCHEMBL3681640 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 286 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12325844-B2 Photoresist remover VERSUM MATERIALS US, LLC (US) 2025-06-10 US claimed
WO-2025108836-A1 COMPOSITIONS FOR REMOVING PHOTORESIST AND ETCH RESIDUES, METHODS OF USING AND USE THEREOF MERCK PATENT GMBH (DE) 2025-05-30 WO claimed
CN-118223024-A Etching solution for copper thick film 松下知识产权经营株式会社 2024-06-21 CN claimed
CN-118084344-A Hydrophilic coating, preparation method and device 江苏菲沃泰纳米科技股份有限公司 2024-05-28 CN claimed
CN-112859552-B Application of vanadium oxide corrosion inhibition fluorine-containing stripping liquid 上海新阳半导体材料股份有限公司 2024-01-05 CN claimed
CN-112859554-B Preparation method of vanadium oxide corrosion inhibition fluorine-containing stripping liquid 上海新阳半导体材料股份有限公司 2023-11-10 CN claimed
CN-112859553-B Vanadium oxide corrosion inhibition fluorine-containing stripping solution 上海新阳半导体材料股份有限公司 2023-11-10 CN claimed
CN-110361941-B Positive photoresist stripping liquid, preparation method and application thereof 上海新阳半导体材料股份有限公司 2023-02-03 CN claimed
US-20220333044-A1 Photoresist Remover VERSUM MATERIALS US, LLC (US) 2022-10-20 US claimed
EP-4038173-A1 PHOTORESIST REMOVER Versum Materials US, LLC (US) 2022-08-10 EP claimed
CN-102666745-A Conductive ink composition without forming particles and method for producing same DONGJIN SEMICHEM CO LTD 2012-09-12 CN claimed
EP-1031884-B1 Resist stripping agent and process of producing semiconductor devices using the same MITSUBISHI GAS CHEMICAL CO (JP) 2012-01-11 EP claimed
US-7968507-B2 Composition for stripping and stripping method SAMSUNG ELECTRONICS CO., LTD. (KR) 2011-06-28 US claimed
CN-101926933-A Chinese medicinal composition for treating gastritis, gastric ulcer and duodenal ulcer and identification method thereof QINGDAO GROWFUL MEDICINE CO LTD 2010-12-29 CN claimed
US-20090084406-A1 Composition for stripping and stripping method SAMSUNG ELECTRONICS CO., LTD. 2009-04-02 US claimed
CN-101327392-A Absorbent for acid gas separation KOREA ELECTRIC POWER CORP (KR) 2008-12-24 CN claimed
US-20060270574-A1 Photoresist stripping agent IKEMOTO KAZUTO 2006-11-30 US claimed
WO-2006063266-A2 ADDITIVE AND VEHICLE FOR INKS, PAINTS, COATINGS AND ADHESIVES OMNITECH ENVIRONMENTAL, LLC (US) 2006-06-15 WO claimed
US-20040137379-A1 Photoresist stripping agent MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-07-15 US claimed
EP-0301925-B1 PROCESS FOR THE ENANTIOSPECIFIC PREPARATION OF (S)2-ETHYL AMINO-1-3-(TRIFLUOROMETHYL PHENYL) PROPANE ADIR ET COMPAGNIE (FR) 1991-10-23 EP claimed