⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17593265 | 0.82 | ALDH1A1 (0.33) | — | |
| SCHEMBL1457911 | 0.78 | — | — | |
| SCHEMBL7035084 | 0.78 | — | — | |
| SCHEMBL4782050 | 0.78 | HTT (0.35) | — | |
| SCHEMBL27774513 | 0.77 | — | — | |
| SCHEMBL11184471 | 0.76 | — | — | |
| SCHEMBL11616465 | 0.76 | HTT (0.34) | — | |
| SCHEMBL7967196 | 0.76 | — | — | |
| SCHEMBL25476008 | 0.75 | — | — | |
| SCHEMBL9733755 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12600697-B2 | Compositions and methods for removal of n-methyl-2-pyrrolidone (NMP) degradation products and other foulants from NMP purification systems | REFINED TECHNOLOGIES, INC. (US) | 2026-04-14 | — | — | US | claimed |
| US-20240132446-A1 | COMPOSITIONS AND METHODS FOR REMOVAL OF N-METHYL-2-PYRROLIDONE (NMP) DEGRADATION PRODUCTS AND OTHER FOULANTS FROM NMP PURIFICATION SYSTEMS | REFINED TECHNOLOGIES, INC. | 2024-04-25 | — | — | US | claimed |
| WO-2022251327-A1 | COMPOSITIONS AND METHODS FOR REMOVAL OF N-METHYL-2-PYRROLIDONE (NMP) DEGRADATION PRODUCTS AND OTHER FOULANTS FROM NMP PURIFICATION SYSTEMS | REFINED TECHNOLOGIES, INC. (US) | 2022-12-01 | — | — | WO | claimed |
| CN-115197385-A | Latent catalysts for the production of polyurethane foams | 莫门蒂夫性能材料股份有限公司 | 2022-10-18 | — | — | CN | claimed |
| CN-102272675-A | A photoresist image-forming process using double patterning | — | 2011-12-07 | — | — | CN | claimed |
| EP-2389612-A1 | A PHOTORESIST IMAGE-FORMING PROCESS USING DOUBLE PATTERNING | AZ Electronic Materials USA Corp. (US) | 2011-11-30 | — | — | EP | claimed |
| WO-2010084372-A1 | A PHOTORESIST IMAGE-FORMING PROCESS USING DOUBLE PATTERNING | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-07-29 | — | — | WO | claimed |
| US-20100183851-A1 | Photoresist Image-forming Process Using Double Patterning | CAO YI | 2010-07-22 | — | — | US | claimed |
| WO-1995003874-A1 | SOLVENT COMPOSITION FOR REMOVING ACID GASES | THE DOW CHEMICAL COMPANY (US) | 1995-02-09 | — | — | WO | claimed |
| US-5246619-A | Condensation of monoethanolamine, n-methyl- | THE DOW CHEMICAL COMPANY (US) | 1993-09-21 | — | — | US | claimed |
| US-12600697-B2 | Compositions and methods for removal of n-methyl-2-pyrrolidone (NMP) degradation products and other foulants from NMP purification systems | REFINED TECHNOLOGIES, INC. (US) | 2026-04-14 | — | — | US | disclosed |
| CN-114478987-B | Polyurethane, method for producing polyurethane, conductive paste composition, conductive wiring, and method for producing conductive wiring | 信越化学工业株式会社 | 2024-07-02 | — | — | CN | disclosed |
| CN-118234824-A | Adhesive, laminate, method for producing laminate, and packaging material | DIC株式会社 | 2024-06-21 | — | — | CN | disclosed |
| CN-118234825-A | Adhesive, laminate, and packaging material | DIC株式会社 | 2024-06-21 | — | — | CN | disclosed |
| CN-118234771-A | Adhesive, laminate, and packaging material | DIC株式会社 | 2024-06-21 | — | — | CN | disclosed |
| US-5246619-A | Condensation of monoethanolamine, n-methyl- | THE DOW CHEMICAL COMPANY (US) | 1993-09-21 | — | — | US | disclosed |
| US-4880934-A | Preparation of hydroxyalkylpiperazinones by reacting a 2,3-dihydroxy-1,4-dioxane with a hydroalkyldiamine | THE DOW CHEMICAL COMPANY (US) | 1989-11-14 | — | — | US | disclosed |
| US-4814443-A | Preparation of hydroxyalkylpiperazinones by reacting glyoxal with hydroxyalkyldiamines | THE DOW CHEMICAL COMPANY (US) | 1989-03-21 | — | — | US | disclosed |
| US-4223138-A | VAPORIZATION, CONDENSATION, RETARDING FLOW TO REACTION ZONE | BAYER AKTIENGESELLSCHAFT (DE) | 1980-09-16 | — | — | US | disclosed |
| US-4151015-A | Flux for use in soldering | LAKE CHEMICAL COMPANY (US) | 1979-04-24 | — | — | US | disclosed |