⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6064715 | 0.83 | — | — | |
| SCHEMBL9427337 | 0.75 | — | — | |
| SCHEMBL727413 | 0.72 | — | — | |
| SCHEMBL1741207 | 0.72 | — | — | |
| SCHEMBL4899100 | 0.70 | — | — | |
| SCHEMBL367450 | 0.68 | — | — | |
| SCHEMBL11593405 | 0.68 | — | — | |
| SCHEMBL1788083 | 0.68 | — | — | |
| SCHEMBL4893851 | 0.68 | PABPC1 (0.31) | — | |
| SCHEMBL10630322 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4396271-A1 | COMPOSITION FOR POLYURETHANE FOAM, FOAM PREPARED THEREFROM AND A METHOD THEREOF | Momentive Performance Materials Inc. (US) | 2024-07-10 | — | — | EP | claimed |
| WO-2023034354-A1 | COMPOSITION FOR POLYURETHANE FOAM, FOAM PREPARED THEREFROM AND A METHOD THEREOF | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2023-03-09 | — | — | WO | claimed |
| EP-4396271-A1 | COMPOSITION FOR POLYURETHANE FOAM, FOAM PREPARED THEREFROM AND A METHOD THEREOF | Momentive Performance Materials Inc. (US) | 2024-07-10 | — | — | EP | disclosed |
| WO-2023034354-A1 | COMPOSITION FOR POLYURETHANE FOAM, FOAM PREPARED THEREFROM AND A METHOD THEREOF | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2023-03-09 | — | — | WO | disclosed |
| EP-2146250-B1 | WATER-SOLUBLE RESIN COMPOSITION FOR THE FORMATION OF MICROPATTERNS AND PROCESS FOR THE FORMATION OF MICROPATTERNS WITH THE SAME | MERCK PATENT GMBH (DE) | 2017-08-23 | — | — | EP | disclosed |
| EP-2389612-A1 | A PHOTORESIST IMAGE-FORMING PROCESS USING DOUBLE PATTERNING | AZ Electronic Materials USA Corp. (US) | 2011-11-30 | — | — | EP | disclosed |
| WO-2010084372-A1 | A PHOTORESIST IMAGE-FORMING PROCESS USING DOUBLE PATTERNING | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-07-29 | — | — | WO | disclosed |
| US-20100183851-A1 | Photoresist Image-forming Process Using Double Patterning | CAO YI | 2010-07-22 | — | — | US | disclosed |
| US-20100119717-A1 | WATER-SOLUBLE RESIN COMPOSITION FOR THE FORMATION OF MICROPATTERNS AND METHOD FOR THE FORMATION OF MICROPATTERNS WITH THE SAME | HONG SUNG-EUN | 2010-05-13 | — | — | US | disclosed |
| EP-2146250-A1 | WATER-SOLUBLE RESIN COMPOSITION FOR THE FORMATION OF MICROPATTERNS AND PROCESS FOR THE FORMATION OF MICROPATTERNS WITH THE SAME | AZ Electronic Materials (Japan) K.K. (JP) | 2010-01-20 | — | — | EP | disclosed |