SCHEMBL1743181

SCHEMBL1743181

CC(=O)C(O)C(C)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2313654 0.81
SCHEMBL15496658 0.81
SCHEMBL9737489 0.78 TSHR (0.38)
Hydrochloric Acid SCHEMBL11637747 0.78
SCHEMBL999971 0.78
SCHEMBL12343886 0.78
SCHEMBL675319 0.78
SCHEMBL19840129 0.76
SCHEMBL71 0.76
SCHEMBL167720 0.76 LMNA (0.46)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118307343-A Tantalum carbide multilayer coating structure and preparation method thereof 上海大学 2024-07-09 CN claimed
WO-2024126332-A1 SACRIFICIAL ADDITIVELY MANUFACTURED MOLD WITH CONTROLLED MOISTURE AND LIQUID ABSORPTION PROPERTIES NEXA3D APS (DK) 2024-06-20 WO claimed
CN-107842706-B running-in method for reducing friction coefficient between metal friction pairs QILU UNIVERSITY OF TECHNOLOGY (CN) 2019-12-10 CN claimed
US-7569619-B2 Radiation-curable resin composition and cured product thereof MITSUBISHI CHEMICAL CORPORATION (JP) 2009-08-04 US claimed
CN-118307343-A Tantalum carbide multilayer coating structure and preparation method thereof 上海大学 2024-07-09 CN disclosed
US-12016856-B2 Compounds and methods for inhibiting NHE-mediated antiport in the treatment of disorders associated with fluid retention or salt overload and gastrointestinal tract disorders ARDELYX, INC. (US) 2024-06-25 US disclosed
WO-2024126332-A1 SACRIFICIAL ADDITIVELY MANUFACTURED MOLD WITH CONTROLLED MOISTURE AND LIQUID ABSORPTION PROPERTIES NEXA3D APS (DK) 2024-06-20 WO disclosed
US-20230257503-A1 RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE MITSUBISHI CHEMICAL CORPORATION (JP) 2023-08-17 US disclosed
EP-4212256-A1 RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE Mitsubishi Chemical Corporation (JP) 2023-07-19 EP disclosed
CN-116212844-A Monoatomic dispersion zirconium silicon modified alumina carrier, preparation method and application thereof 中国科学院大连化学物理研究所 2023-06-06 CN disclosed
CN-107842706-B running-in method for reducing friction coefficient between metal friction pairs QILU UNIVERSITY OF TECHNOLOGY (CN) 2019-12-10 CN disclosed
CN-107842706-B running-in method for reducing friction coefficient between metal friction pairs QILU UNIVERSITY OF TECHNOLOGY (CN) 2019-12-10 CN disclosed
US-5800606-A Ultrafine reactive silica particles, suspension containing the same, and hard coating composition MITSUBISHI CHEMICAL CORPORATION (JP) 1998-09-01 US disclosed
US-5733644-A TETRAMETHOXYSILANE AND WATER, PROTECTIVE COATING FILM MITSUBISHI CHEMICAL CORPORATION (JP) 1998-03-31 US disclosed
EP-0803778-A1 TREATING FLUID FOR MAKING WATERLESS LITHOGRAPHIC PLATE TORAY INDUSTRIES, INC. (JP) 1997-10-29 EP disclosed
EP-0757079-A1 CURABLE COMPOSITION AND PROCESS FOR PRODUCING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 1997-02-05 EP disclosed
EP-0736488-A1 ULTRAFINE REACTIVE SILICA PARTICLES, SUSPENSION CONTAINING THE SAME, AND HARD COATING COMPOSITION MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) 1996-10-09 EP disclosed
EP-0672950-A1 WATERLESS LITHOGRAPHIC PLATE TORAY INDUSTRIES, INC. (JP) 1995-09-20 EP disclosed
EP-0321174-A2 Process for preparing aminopropyl silanes Tonen Corporation (JP) 1989-06-21 EP disclosed
CN-87105636-A The non-self-crosslinking adhesive composition contains the water japanning liquid and the application thereof of this binder composition 1988-03-02 CN disclosed