Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 7/20 | 0.47 |
| ▸ | HPGD | P15428 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.47 |
| ▸ | TP53 | P04637 | 3/20 | 0.40 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.40 |
| ▸ | THRB | P10828 | 2/20 | 0.35 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1632851 | 0.81 | TSHR (0.44) | TSHRALDH1A1THRB | |
| SCHEMBL4849695 | 0.78 | TSHR (0.53) | TSHRHPGDALDH1A1CYP3A4TP53 | |
| SCHEMBL344380 | 0.75 | TSHR (0.58) | TSHRHPGDALDH1A1CYP3A4TP53 | |
| SCHEMBL1741816 | 0.74 | TSHR (0.57) | TSHRHPGDALDH1A1CYP3A4TP53 | |
| SCHEMBL19178200 | 0.74 | TSHR (0.39) | TSHRHPGDALDH1A1CYP3A4TP53 | |
| SCHEMBL11442386 | 0.74 | TSHR (0.56) | TSHRHPGDALDH1A1CYP3A4TP53 | |
| SCHEMBL3376502 | 0.73 | TSHR (0.55) | TSHRHPGDALDH1A1CYP3A4TP53 | |
| SCHEMBL6691949 | 0.73 | TSHR (0.50) | TSHRHPGDALDH1A1CYP3A4TP53 | |
| SCHEMBL6908183 | 0.72 | TSHR (0.46) | TSHRHPGDALDH1A1CYP3A4TP53 | |
| SCHEMBL1585542 | 0.72 | TSHR (0.63) | TSHRHPGDALDH1A1CYP3A4TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2388119-B1 | An imprint lithography process | CANON NANOTECHNOLOGIES INC (US) | 2016-09-07 | — | — | EP | disclosed |
| US-8318066-B2 | Step and repeat imprint lithography process | MOLECULAR IMPRINTS, INC. (US) | 2012-11-27 | — | — | US | disclosed |
| EP-2388119-A1 | An imprint lithography process | Molecular Imprints, Inc. (US) | 2011-11-23 | — | — | EP | disclosed |
| US-20110252704-A1 | FABRICATED CULTIVATION BOX AND FABRICATED LANDSCAPE ARCHITECTURE SYSTEM | CHO HEUNG-YEUL | 2011-10-20 | — | — | US | disclosed |
| US-8021594-B2 | Preserving filled features when vacuum wiping | MOLECULAR IMPRINTS, INC. (US) | 2011-09-20 | — | — | US | disclosed |
| US-20110221095-A1 | Step and Repeat Imprint Lithography Process | MOLECULAR IMPRINTS, INC. (US) | 2011-09-15 | — | — | US | disclosed |
| US-7943081-B2 | Step and repeat imprint lithography processes | MOLECULAR IMPRINTS, INC. (US) | 2011-05-17 | — | — | US | disclosed |
| US-20100201042-A1 | Step and Repeat Imprint Lithography Processes | MOLECULAR IMPRINTS, INC. (US) | 2010-08-12 | — | — | US | disclosed |
| US-7727453-B2 | Step and repeat imprint lithography processes | MOLECULAR IMPRINTS, INC. (US) | 2010-06-01 | — | — | US | disclosed |
| US-20100053578-A1 | Apparatus for imprint lithography using an electric field | MOLECULAR IMPRINTS, INC. (US) | 2010-03-04 | — | — | US | disclosed |
| US-6900881-B2 | Step and repeat imprint lithography systems | MOLECULAR IMPRINTS, INC. (US) | 2005-05-31 | — | — | US | disclosed |
| US-20040124566-A1 | Step and repeat imprint lithography processes | CITIBANK, N.A. | 2004-07-01 | — | — | US | disclosed |
| WO-2004016406-A1 | IMPRINT LITHOGRAPHY PROCESSES AND SYSTEMS | MOLECULAR IMPRINTS, INC. (US) | 2004-02-26 | — | — | WO | disclosed |
| WO-2004013693-A2 | SCATTEROMETRY ALIGNMENT FOR IMPRINT LITHOGRAPHY | MOLECULAR IMPRINTS, INC. (US) | 2004-02-12 | — | — | WO | disclosed |
| US-20040021866-A1 | Scatterometry alignment for imprint lithography | CITIBANK, N.A. | 2004-02-05 | — | — | US | disclosed |
| US-20040022888-A1 | Alignment systems for imprint lithography | CITIBANK, N.A. | 2004-02-05 | — | — | US | disclosed |
| US-20040021254-A1 | Alignment methods for imprint lithography | CITIBANK, N.A. | 2004-02-05 | — | — | US | disclosed |
| US-20040007799-A1 | Formation of discontinuous films during an imprint lithography process | CITIBANK, N.A. | 2004-01-15 | — | — | US | disclosed |
| US-20040008334-A1 | Step and repeat imprint lithography systems | CITIBANK, N.A. | 2004-01-15 | — | — | US | disclosed |
| US-20040009673-A1 | Method and system for imprint lithography using an electric field | MOLECULAR IMPRINTS, INC. | 2004-01-15 | — | — | US | disclosed |