SCHEMBL17447096

SCHEMBL17447096

COc1ccc(/C=C/c2nc(C)nc(C(Cl)(Cl)Cl)n2)cc1OC

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.48
ALDH1A1 P00352 1/20 0.48
HPGD P15428 1/20 0.48
SMN1; SMN2 Q16637 1/20 0.48
NQO2 P16083 4/20 0.47
CYP1A1 P04798 9/20 0.47
CYP1B1 Q16678 8/20 0.47
CYP1A2 P05177 3/20 0.47
TUBB4A P04350 1/20 0.47
TUBB P07437 1/20 0.47
TUBA3C P0DPH7 1/20 0.47
TUBA1B P68363 1/20 0.47
TUBA4A P68366 1/20 0.47
TUBB4B P68371 1/20 0.47
TUBB3 Q13509 1/20 0.47
TUBB2A Q13885 1/20 0.47
TUBB8 Q3ZCM7 1/20 0.47
TUBA3E Q6PEY2 1/20 0.47
TUBA1A Q71U36 1/20 0.47
TUBA1C Q9BQE3 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12595133 1.00 MAPT (0.48) MAPTALDH1A1HPGDSMN1; SMN2NQO2
SCHEMBL21940413 0.92 MAPT (0.53) MAPTALDH1A1HPGDSMN1; SMN2NQO2
SCHEMBL151091 0.92 MAPT (0.53) MAPTALDH1A1HPGDSMN1; SMN2NQO2
SCHEMBL29417481 0.92 MAPT (0.53) MAPTALDH1A1HPGDSMN1; SMN2NQO2
SCHEMBL151090 0.92 MAPT (0.53) MAPTALDH1A1HPGDSMN1; SMN2NQO2
SCHEMBL29363338 0.92 MAPT (0.53) MAPTALDH1A1HPGDSMN1; SMN2NQO2
SCHEMBL17447098 0.91 TUBB1 (0.46) MAPTALDH1A1HPGDSMN1; SMN2NQO2
SCHEMBL28106861 0.84 MAPT (0.47) MAPTALDH1A1HPGDSMN1; SMN2NQO2
SCHEMBL12595129 0.82 RELA (0.47) MAPTALDH1A1HPGDSMN1; SMN2NQO2
SCHEMBL12379805 0.82 RELA (0.47) MAPTALDH1A1HPGDSMN1; SMN2NQO2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9851635-B2 Photoresist composition and method of manufacturing substrate for display device by using the same SAMSUNG DISPLAY CO., LTD. (KR) 2017-12-26 US disclosed
US-20160018731-A1 PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SUBSTRATE FOR DISPLAY DEVICE BY USING THE SAME MERCK PATENT GMBH (DE) 2016-01-21 US disclosed