Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FDPS | P14324 | 1/20 | 0.44 |
| ▸ | BLM | P54132 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
| ▸ | CA4 | P22748 | 1/20 | 0.33 |
| ▸ | TPI1 | P60174 | 1/20 | 0.32 |
| ▸ | INPPL1 | O15357 | 2/20 | 0.32 |
| ▸ | INPP5A | Q14642 | 2/20 | 0.32 |
| ▸ | SMPD1 | P17405 | 1/20 | 0.32 |
| ▸ | INPP5B | P32019 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | ITPR3 | Q14573 | 3/20 | 0.30 |
| ▸ | ITPR2 | Q14571 | 1/20 | 0.30 |
| ▸ | ITPR1 | Q14643 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10420313 | 0.81 | FDPS (0.35) | FDPSBLMTDP1CA2 | |
| SCHEMBL26847970 | 0.74 | PPARD (0.33) | FDPSBLMTDP1 | |
| SCHEMBL26847996 | 0.74 | — | — | |
| SCHEMBL27097413 | 0.72 | FDPS (0.39) | FDPSBLMTDP1CA4CA2 | |
| SCHEMBL437818 | 0.72 | — | — | |
| Pyrophosphoric Acid SCHEMBL29634664 | 0.61 | — | — | |
| Peroxymonophosphate SCHEMBL74096 | 0.61 | — | — | |
| Pyrophosphoric Acid SCHEMBL292348 | 0.61 | FDPS (1.00) | FDPSBLMTDP1CA4INPPL1 | |
| Pyrophosphoric Acid SCHEMBL3654 | 0.61 | — | — | |
| SCHEMBL309434 | 0.61 | FDPS (0.54) | FDPSBLMTDP1CA4INPPL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11912902-B2 | Composition for etching and manufacturing method of semiconductor device using the same | SOULBRAIN CO., LTD. (KR) | 2024-02-27 | — | — | US | disclosed |
| US-20230141924-A1 | COMPOSITION FOR ETCHING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME | SOULBRAIN CO., LTD. (KR) | 2023-05-11 | — | — | US | disclosed |
| US-20230136538-A1 | COMPOSITION FOR ETCHING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME | SOULBRAIN CO., LTD. (KR) | 2023-05-04 | — | — | US | disclosed |
| US-20180179442-A1 | COMPOSITION FOR ETCHING | SOULBRAIN CO., LTD. (KR) | 2018-06-28 | — | — | US | disclosed |
| US-9868902-B2 | Composition for etching | SOULBRAIN CO., LTD. (KR) | 2018-01-16 | — | — | US | disclosed |
| US-20160017224-A1 | COMPOSITION FOR ETCHING | SOULBRAIN CO., LTD. (KR) | 2016-01-21 | — | — | US | disclosed |