SCHEMBL17476641

SCHEMBL17476641

C=Cc1ccc(S(=O)(=O)O)cc1.[MgH2]

nearest known ligand 0.95

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.95
ALDH1A1 P00352 8/20 0.50
LMNA P02545 3/20 0.50
TSHR P16473 5/20 0.48
NT5E P21589 1/20 0.48
SMN1; SMN2 Q16637 3/20 0.46
POLB P06746 1/20 0.41
CYP2D6 P10635 1/20 0.41
HSD17B10 Q99714 4/20 0.38
MAPT P10636 2/20 0.38
HTT P42858 2/20 0.38
NPC1 O15118 1/20 0.38
TP53 P04637 1/20 0.38
XBP1 P17861 1/20 0.38
MAPK1 P28482 1/20 0.38
RAB9A P51151 1/20 0.38
MDM2 Q00987 1/20 0.38
KDM4E B2RXH2 3/20 0.36
HCRTR1 O43613 1/20 0.35
HCRTR2 O43614 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL452529 0.98 TDP1 (1.00) TDP1ALDH1A1LMNATSHRNT5E
SCHEMBL25711 0.98 TDP1 (1.00) TDP1ALDH1A1LMNATSHRNT5E
SCHEMBL31126649 0.98 TDP1 (1.00) TDP1ALDH1A1LMNATSHRNT5E
Hydrochloric Acid SCHEMBL8527191 0.95 TDP1 (0.95) TDP1ALDH1A1LMNATSHRNT5E
SCHEMBL94888 0.95 TDP1 (0.95) TDP1ALDH1A1LMNATSHRNT5E
Ammonia Solution, Strong SCHEMBL814454 0.95 TDP1 (0.95) TDP1ALDH1A1LMNATSHRNT5E
SCHEMBL5621481 0.95 TDP1 (0.95) TDP1ALDH1A1LMNATSHRNT5E
SCHEMBL2198423 0.95 TDP1 (0.95) TDP1ALDH1A1LMNATSHRNT5E
SCHEMBL331672 0.95 TDP1 (0.95) TDP1ALDH1A1LMNATSHRNT5E
SCHEMBL2121269 0.95 TDP1 (0.95) TDP1ALDH1A1LMNATSHRNT5E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105102498-B Copolymer and hydrophilic material comprising the same 三井化学株式会社 2017-04-12 CN disclosed
CN-105073917-B The film formed by copolymer or compositions 三井化学株式会社 2016-11-02 CN disclosed
US-20160046827-A1 FILM COMPRISING COPOLYMER OR COMPOSITION MITSUI CHEMICALS, INC. (JP) 2016-02-18 US disclosed
EP-2985324-A1 FILM COMPRISING COPOLYMER OR COMPOSITION Mitsui Chemicals, Inc. (JP) 2016-02-17 EP disclosed
US-20160032036-A1 COPOLYMER AND HYDROPHILIC MATERIAL COMPOSED OF THE SAME MITSUI CHEMICALS, INC. (JP) 2016-02-04 US disclosed
CN-105102498-A Copolymer and hydrophilic material comprising the same MITSUI CHEMICALS INC 2015-11-25 CN disclosed
CN-105073917-A Film comprising copolymer or composition MITSU CHEMICALS INC 2015-11-18 CN disclosed