SCHEMBL17522503

SCHEMBL17522503

CC(C)C(=O)OC1CCCC1=O

nearest known ligand 0.46

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.42
POLB P06746 2/20 0.42
USP2 O75604 1/20 0.42
LMNA P02545 1/20 0.42
KDM4E B2RXH2 2/20 0.41
HSD17B10 Q99714 1/20 0.41
PTGS1 P23219 1/20 0.41
PTGS2 P35354 1/20 0.41
MAPT P10636 1/20 0.40
PKM P14618 2/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
CYP2D6 P10635 1/20 0.38
THRB P10828 1/20 0.37
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19103228 0.89 POLB (0.35) ALDH1A1POLBUSP2LMNAKDM4E
SCHEMBL14556455 0.83 CYP2D6 (0.40) ALDH1A1POLBUSP2LMNAKDM4E
SCHEMBL12705208 0.82 ALDH1A1 (0.47) ALDH1A1POLBUSP2LMNAKDM4E
SCHEMBL12705204 0.81 ALDH1A1 (0.39) ALDH1A1POLBUSP2LMNAKDM4E
SCHEMBL5732560 0.79 KDM4E (0.49) ALDH1A1POLBUSP2LMNAKDM4E
SCHEMBL3830715 0.79 MAPT (0.47) ALDH1A1POLBUSP2LMNAKDM4E
SCHEMBL12705209 0.77 ALDH1A1 (0.43) ALDH1A1POLBUSP2LMNAKDM4E
SCHEMBL13938731 0.77 ALDH1A1 (0.35) ALDH1A1POLBUSP2LMNAKDM4E
SCHEMBL12705206 0.76 ALDH1A1 (0.44) ALDH1A1POLBUSP2LMNAKDM4E
SCHEMBL17679424 0.76 MAPT (0.44) ALDH1A1POLBUSP2LMNAKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10007178-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-26 US disclosed
CN-105777611-A Synthetic method for preparing ramipril key intermediate from serine 浙江工业大学 2016-07-20 CN disclosed
US-20160048076-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-02-18 US disclosed
US-20160048076-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-02-18 US disclosed