SCHEMBL17535320

SCHEMBL17535320

CC1=C([Y](C2=C(C)C=CC2)(C2=C(C)C=CC2)C2=C(C)C=CC2)CC=C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL409596 0.67
SCHEMBL216231 0.67
SCHEMBL8162371 0.67
SCHEMBL1053159 0.65
Hydrochloric Acid SCHEMBL2159369 0.65
SCHEMBL15541840 0.65
SCHEMBL9705999 0.65
SCHEMBL7263423 0.65
SCHEMBL9299246 0.65
SCHEMBL1305709 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11424253-B2 Device including a floating gate electrode and a layer of ferroelectric material and method for the formation thereof NAMLAB GGMBH (DE) 2022-08-23 US disclosed
US-20180151577-A1 DEVICE INCLUDING A FLOATING GATE ELECTRODE AND A LAYER OF FERROELECTRIC MATERIAL AND METHOD FOR THE FORMATION THEREOF FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWAN DTEN FORSCHUNG E.V. (DE) 2018-05-31 US disclosed
US-9966466-B2 Semiconductor-on-insulator wafer, semiconductor structure including a transistor, and methods for the formation and operation thereof GLOBALFOUNDRIES INC. (KY) 2018-05-08 US disclosed
US-20180040731-A1 SEMICONDUCTOR-ON-INSULATOR WAFER, SEMICONDUCTOR STRUCTURE INCLUDING A TRANSISTOR, AND METHODS FOR THE FORMATION AND OPERATION THEREOF GLOBALFOUNDRIES U.S. INC. 2018-02-08 US disclosed
US-9865608-B2 Method of forming a device including a floating gate electrode and a layer of ferroelectric material GLOBALFOUNDRIES INC. (KY) 2018-01-09 US disclosed
US-20160268271-A1 METHOD OF FORMING A DEVICE INCLUDING A FLOATING GATE ELECTRODE AND A LAYER OF FERROELECTRIC MATERIAL GLOBALFOUNDRIES U.S. INC. 2016-09-15 US disclosed
US-20160071947-A1 METHOD INCLUDING A REPLACEMENT OF A DUMMY GATE STRUCTURE WITH A GATE STRUCTURE INCLUDING A FERROELECTRIC MATERIAL GLOBALFOUNDRIES U.S. INC. 2016-03-10 US disclosed
US-20160064510-A1 DEVICE INCLUDING A FLOATING GATE ELECTRODE AND A LAYER OF FERROELECTRIC MATERIAL AND METHOD FOR THE FORMATION THEREOF GLOBALFOUNDRIES U.S. INC. 2016-03-03 US disclosed