⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18211285 | 0.84 | — | — | |
| SCHEMBL17545745 | 0.83 | — | — | |
| SCHEMBL18789427 | 0.75 | — | — | |
| SCHEMBL546903 | 0.75 | — | — | |
| SCHEMBL17545686 | 0.75 | ATM (0.39) | — | |
| SCHEMBL17545688 | 0.74 | TDP1 (0.41) | — | |
| SCHEMBL17540307 | 0.73 | — | — | |
| SCHEMBL685833 | 0.70 | — | — | |
| SCHEMBL2606032 | 0.69 | — | — | |
| SCHEMBL13062041 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9599897-B2 | Salt, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-03-21 | — | — | US | disclosed |
| US-20160052877-A1 | SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-02-25 | — | — | US | disclosed |