SCHEMBL17545688

SCHEMBL17545688

C=Cc1ccc(S(=O)(=O)NS(=O)(=O)C(F)(F)C(=O)OC)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TDP1 Q9NUW8 1/20 0.41
▸ GAA P10253 1/20 0.37
▸ L3MBTL1 Q9Y468 1/20 0.37
▸ MCL1 Q07820 2/20 0.35
▸ HDAC1 Q13547 4/20 0.34
▸ SMN1; SMN2 Q16637 2/20 0.34
▸ HTT P42858 2/20 0.34
▸ HDAC8 Q9BY41 2/20 0.34
▸ MAPT P10636 1/20 0.34
▸ HSD17B10 Q99714 1/20 0.34
▸ HDAC4 P56524 3/20 0.33
▸ MEN1 O00255 1/20 0.33
▸ KMT2A Q03164 1/20 0.33
▸ MMP1 P03956 2/20 0.33
▸ MMP2 P08253 2/20 0.33
▸ MMP9 P14780 2/20 0.33
▸ MMP13 P45452 2/20 0.33
▸ CA1 P00915 1/20 0.33
▸ CA2 P00918 1/20 0.33
▸ MMP8 P22894 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16850406 0.80 TDP1 (0.44) TDP1MCL1HDAC1SMN1; SMN2MAPT
SCHEMBL14771733 0.79 TDP1 (0.47) TDP1MCL1CA1CA2
SCHEMBL17545689 0.78 KMT2A (0.41) TDP1MCL1SMN1; SMN2MAPTHDAC4
SCHEMBL28671646 0.78 TDP1 (0.46) TDP1MCL1CA1CA2
SCHEMBL28671677 0.78 TDP1 (0.46) TDP1MCL1CA1CA2
SCHEMBL17540316 0.77 CA1 (0.43) TDP1GAAL3MBTL1MCL1HDAC1
SCHEMBL17545686 0.77 ATM (0.39) TDP1SMN1; SMN2
SCHEMBL17545704 0.77 CA2 (0.36) TDP1L3MBTL1HDAC1MEN1KMT2A
SCHEMBL17545747 0.76 TDP1 (0.40) TDP1GAAL3MBTL1HTTMEN1
SCHEMBL17545715 0.75 TSHR (0.38) TDP1NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9599897-B2 Salt, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-03-21 — — US disclosed
US-20160052877-A1 SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-02-25 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160052877-A1 SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN RER1, AFF1, FRG1 TDP1 4562/4885GAA 4651/4885L3MBTL1 199/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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