⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17550510 | 0.92 | — | — | |
| SCHEMBL17548726 | 0.90 | ALDH1A1 (0.32) | — | |
| SCHEMBL17548732 | 0.87 | — | — | |
| SCHEMBL17548727 | 0.84 | TSHR (0.34) | — | |
| SCHEMBL17548730 | 0.83 | — | — | |
| SCHEMBL17550509 | 0.83 | — | — | |
| SCHEMBL17548728 | 0.82 | ALDH1A1 (0.38) | — | |
| SCHEMBL17550508 | 0.82 | MEN1 (0.30) | — | |
| SCHEMBL17548715 | 0.82 | MEN1 (0.31) | — | |
| SCHEMBL17548713 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9760005-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-09-12 | — | — | US | disclosed |
| US-20160062233-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-03 | — | — | US | disclosed |