⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17549974 | 0.87 | — | — | |
| SCHEMBL17549982 | 0.84 | — | — | |
| SCHEMBL14363816 | 0.76 | HMGCR (0.36) | — | |
| SCHEMBL17549983 | 0.76 | — | — | |
| SCHEMBL18774891 | 0.76 | HMGCR (0.32) | — | |
| SCHEMBL12667237 | 0.75 | — | — | |
| SCHEMBL25894223 | 0.75 | HMGCR (0.30) | — | |
| SCHEMBL2740789 | 0.75 | — | — | |
| SCHEMBL75937 | 0.75 | ALDH1A1 (0.32) | — | |
| SCHEMBL13580536 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170285469-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO, CO., LTD. (JP) | 2017-10-05 | — | — | US | disclosed |
| US-9341947-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-05-17 | — | — | US | disclosed |
| US-20160062236-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-03-03 | — | — | US | disclosed |