SCHEMBL17552687

SCHEMBL17552687

[SiH3]Cc1ccc(Cl)c(Cl)c1

nearest known ligand 0.58

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
▸ IDO1 P14902 4/20 0.58
▸ PNMT P11086 2/20 0.54
▸ TAAR1 Q96RJ0 1/20 0.54
▸ SIGMAR1 Q99720 3/20 0.47
▸ POLB P06746 1/20 0.45
▸ SMN1; SMN2 Q16637 1/20 0.45
▸ IGF1R P08069 1/20 0.45
▸ ALOX15 P16050 1/20 0.45
▸ AHR P35869 1/20 0.43
▸ TP53 P04637 1/20 0.43
▸ DBH P09172 1/20 0.43
▸ FDPS P14324 1/20 0.42
▸ TSHR P16473 1/20 0.42
▸ SLC6A2 P23975 1/20 0.42
▸ SLC6A4 P31645 1/20 0.42
▸ SLC6A3 Q01959 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16404687 0.80 PNMT (0.61) IDO1PNMTTAAR1SIGMAR1IGF1R
SCHEMBL17552701 0.78 PIK3CA (0.44) IDO1PNMTTAAR1TSHRSLC6A4
SCHEMBL17552711 0.78 MAPT (0.41) IDO1PNMTTAAR1SLC6A2SLC6A4
SCHEMBL3298586 0.78 IDO1 (0.64) IDO1PNMTTAAR1SIGMAR1POLB
SCHEMBL17372921 0.76 IDO1 (0.61) IDO1PNMTTAAR1SIGMAR1POLB
SCHEMBL407334 0.76 IDO1 (0.61) IDO1PNMTTAAR1SIGMAR1POLB
SCHEMBL29494831 0.76 IDO1 (0.61) IDO1PNMTTAAR1SIGMAR1POLB
Bromide SCHEMBL1964769 0.74 IDO1 (0.58) IDO1PNMTTAAR1SIGMAR1POLB
SCHEMBL92905 0.74 IDO1 (0.58) IDO1PNMTTAAR1SIGMAR1POLB
SCHEMBL9663794 0.74 IDO1 (0.58) IDO1PNMTTAAR1SIGMAR1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9312127-B2 Method for producing semiconductor apparatus substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 — — US disclosed
US-9312127-B2 Method for producing semiconductor apparatus substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 — — US disclosed
US-20160064220-A1 METHOD FOR PRODUCING SEMICONDUCTOR APPARATUS SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-03-03 — — US disclosed
US-20160064220-A1 METHOD FOR PRODUCING SEMICONDUCTOR APPARATUS SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-03-03 — — US disclosed
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