Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MGAM | O43451 | 4/20 | 0.45 |
| ▸ | GAA | P10253 | 4/20 | 0.45 |
| ▸ | SI | P14410 | 4/20 | 0.45 |
| ▸ | MGAM2 | Q2M2H8 | 4/20 | 0.45 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.40 |
| ▸ | MAPK13 | O15264 | 2/20 | 0.39 |
| ▸ | MAPK12 | P53778 | 2/20 | 0.39 |
| ▸ | MAPK11 | Q15759 | 2/20 | 0.39 |
| ▸ | MAPK14 | Q16539 | 2/20 | 0.39 |
| ▸ | RAF1 | P04049 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | BCHE | P06276 | 1/20 | 0.39 |
| ▸ | ACHE | P22303 | 1/20 | 0.39 |
| ▸ | GCGR | P47871 | 1/20 | 0.39 |
| ▸ | GUSB | P08236 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL476598 | 0.88 | MAPK13 (0.44) | MGAMGAASIMGAM2HSD11B1 | |
| SCHEMBL22507469 | 0.81 | HSD11B1 (0.49) | MGAMGAASIMGAM2HSD11B1 | |
| SCHEMBL2689067 | 0.78 | HSD11B1 (0.54) | GAAHSD11B1KDM4EMAPK1HPGD | |
| SCHEMBL31467384 | 0.78 | HSD11B1 (0.54) | GAAHSD11B1KDM4EMAPK1HPGD | |
| SCHEMBL4652725 | 0.77 | MGAM (0.47) | MGAMGAASIMGAM2KDM4E | |
| SCHEMBL4205066 | 0.77 | HSD11B1 (0.45) | MGAMGAASIMGAM2HSD11B1 | |
| SCHEMBL2948138 | 0.75 | MAPK13 (0.58) | MGAMKDM4EMAPK13MAPK12MAPK11 | |
| SCHEMBL30298822 | 0.74 | MDM2 (0.44) | HSD11B1KDM4EMAPK1 | |
| SCHEMBL20504034 | 0.70 | MAPK13 (0.60) | MGAMKDM4EMAPK13MAPK12MAPK11 | |
| SCHEMBL29732583 | 0.70 | MAPK13 (0.60) | MGAMKDM4EMAPK13MAPK12MAPK11 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118276408-A | Photosensitive resin composition, photo-cured pattern formed thereby, and display device including photo-cured pattern | 东友精细化工有限公司 | 2024-07-02 | — | — | CN | disclosed |
| CN-117471850-A | Photosensitive composition, method for producing patterned cured product, and black matrix | 东京应化工业株式会社 | 2024-01-30 | — | — | CN | disclosed |
| CN-117186663-A | Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element | 日产化学工业株式会社 | 2023-12-08 | — | — | CN | disclosed |
| CN-108139632-B | Liquid crystal display element | 日产化学工业株式会社 | 2023-12-05 | — | — | CN | disclosed |
| CN-117031874-A | Negative photosensitive resin composition, cured product, and method for producing patterned cured product | 东京应化工业株式会社 | 2023-11-10 | — | — | CN | disclosed |
| CN-116661029-A | Method for producing optical element, and photosensitive composition | 东京应化工业株式会社 | 2023-08-29 | — | — | CN | disclosed |
| CN-116478680-A | Quantum dot, quantum dot dispersion, light-converting curable composition, cured film formed using the composition, and image display device | 东友精细化工有限公司 | 2023-07-25 | — | — | CN | disclosed |
| CN-116478681-A | Quantum dot, quantum dot dispersion, light-converting curable composition, cured film formed using the composition, and image display device | 东友精细化工有限公司 | 2023-07-25 | — | — | CN | disclosed |
| CN-115038728-A | Photocurable composition | 捷恩智株式会社 | 2022-09-09 | — | — | CN | disclosed |
| CN-114846397-A | Method for manufacturing patterned liquid crystal display element | 日产化学株式会社 | 2022-08-02 | — | — | CN | disclosed |
| CN-105765011-B | Photo-curing ink-jet ink and application thereof | 捷恩智株式会社 | 2020-02-28 | — | — | CN | disclosed |
| CN-110760257-A | Curable composition, cured film and color filter substrate | 捷恩智株式会社 | 2020-02-07 | — | — | CN | disclosed |
| CN-110621711-A | Photocurable composition containing fluorine-based polymer | 捷恩智株式会社 | 2019-12-27 | — | — | CN | disclosed |
| CN-110582546-A | Photocurable ink for inkjet | 捷恩智株式会社 | 2019-12-17 | — | — | CN | disclosed |
| CN-105607422-B | Alkali-soluble resin, photosensitive resin composition containing same and application | 奇美实业股份有限公司 | 2019-11-12 | — | — | CN | disclosed |
| CN-105607422-A | Alkali-soluble resin, photosensitive resin composition containing same and application | CHI MEI CORP | 2016-05-25 | — | — | CN | disclosed |
| EP-2993519-A1 | METHOD FOR MANUFACTURING BASE MATERIAL HAVING RECESSED PATTERN, COMPOSITION, METHOD FOR FORMING ELECTRICALLY CONDUCTIVE FILM, ELECTRONIC CIRCUIT AND ELECTRONIC DEVICE | JSR Corporation (JP) | 2016-03-09 | — | — | EP | disclosed |
| CN-105182685-A | Photosensitive resin composition for color filter and application thereof | CHI MEI CORP | 2015-12-23 | — | — | CN | disclosed |
| CN-104345558-A | blue photosensitive resin composition for color filter and application thereof | CHI MEI CORP | 2015-02-11 | — | — | CN | disclosed |
| CN-104181771-A | blue photosensitive resin composition for color filter and color filter | CHI MEI CORP | 2014-12-03 | — | — | CN | disclosed |