⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17581068 | 0.64 | — | — | |
| SCHEMBL3232779 | 0.62 | — | — | |
| SCHEMBL9491519 | 0.62 | XIAP (0.40) | — | |
| SCHEMBL22654548 | 0.55 | CDC25A (0.38) | — | |
| SCHEMBL988700 | 0.55 | LMNA (0.33) | — | |
| Formaldehyde SCHEMBL11147643 | 0.54 | — | — | |
| SCHEMBL9579699 | 0.54 | — | — | |
| SCHEMBL2292804 | 0.54 | — | — | |
| SCHEMBL1004361 | 0.47 | — | — | |
| SCHEMBL2983549 | 0.47 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10088612-B2 | Alkali-soluble resin, photosensitive resin composition for color filter containing the same and uses thereof | CHI MEI CORPORATION (TW) | 2018-10-02 | — | — | US | disclosed |
| US-9568823-B2 | Photosensitive resin composition for color filter and uses thereof | CHI MEI CORPORATION (TW) | 2017-02-14 | — | — | US | disclosed |
| US-20160139309-A1 | ALKALI-SOLUBLE RESIN, PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER CONTAINING THE SAME AND USES THEREOF | CHI MEI CORPORATION (TW) | 2016-05-19 | — | — | US | disclosed |
| US-20160077428-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND USES THEREOF | CHI MEI CORPORATION (TW) | 2016-03-17 | — | — | US | disclosed |