SCHEMBL17599282

SCHEMBL17599282

O=C1c2cccc3c(N4CCCCC4)ccc(c23)C(=O)N1OS(=O)(=O)C(F)(F)F

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 12/20 0.55
KMT2A Q03164 12/20 0.55
MAPT P10636 6/20 0.55
HTT P42858 6/20 0.55
L3MBTL1 Q9Y468 4/20 0.55
TLR9 Q9NR96 2/20 0.55
RAB9A P51151 2/20 0.53
MAPK1 P28482 2/20 0.53
NPC1 O15118 1/20 0.53
AVPR1A P37288 1/20 0.53
LMNA P02545 5/20 0.52
USP2 O75604 4/20 0.52
POLB P06746 2/20 0.52
CRHBP P24387 1/20 0.52
CRHR2 Q13324 1/20 0.52
TDP1 Q9NUW8 1/20 0.52
ALDH1A1 P00352 4/20 0.51
CASP1 P29466 3/20 0.51
SMN1; SMN2 Q16637 3/20 0.51
TSHR P16473 2/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17613112 0.99 MEN1 (0.53) MEN1KMT2AMAPTHTTL3MBTL1
SCHEMBL17620399 0.90 MEN1 (0.44) MEN1KMT2AMAPTHTTL3MBTL1
SCHEMBL17620396 0.90 BRD1 (0.50) MEN1KMT2AMAPTHTTL3MBTL1
SCHEMBL17620403 0.90 MCL1 (0.53) MEN1KMT2AMAPTHTTL3MBTL1
SCHEMBL17620402 0.90 MEN1 (0.53) MEN1KMT2AMAPTHTTL3MBTL1
SCHEMBL17613111 0.84 KMT2A (0.42) MEN1KMT2AMAPTHTTL3MBTL1
SCHEMBL17613110 0.84 KMT2A (0.43) MEN1KMT2AMAPTHTTL3MBTL1
SCHEMBL17620395 0.82 MEN1 (0.54) MEN1KMT2AMAPTHTTL3MBTL1
SCHEMBL19015179 0.80 MEN1 (0.54) MEN1KMT2AMAPTHTTL3MBTL1
SCHEMBL22228999 0.79 KMT2A (0.47) MEN1KMT2AMAPTHTTL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230314943-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST FILM USING THE SAME MERCK PATENT GMBH (DE) 2023-10-05 US disclosed
US-20230314943-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST FILM USING THE SAME MERCK PATENT GMBH (DE) 2023-10-05 US disclosed
EP-3182203-A1 A COMBINATION OF NIT DERIVATIVES WITH SENSITIZERS Heraeus Precious Metals North America Daychem LLC (US) 2017-06-21 EP disclosed
EP-3182203-A1 A COMBINATION OF NIT DERIVATIVES WITH SENSITIZERS Heraeus Precious Metals North America Daychem LLC (US) 2017-06-21 EP disclosed
WO-2016043558-A1 PHOTO-ACID GENERATING AGENT HERAEUS MATERIALS KOREA CORPORATION (KR) 2016-03-24 WO disclosed
WO-2016043558-A1 PHOTO-ACID GENERATING AGENT HERAEUS MATERIALS KOREA CORPORATION (KR) 2016-03-24 WO disclosed
EP-2998297-A1 Photo-acid generating compounds, compositions comprising said compounds, composite and process for making said composite as well as uses of said compounds Heraeus Materials Korea Corporation (KR) 2016-03-23 EP disclosed
EP-2998297-A1 Photo-acid generating compounds, compositions comprising said compounds, composite and process for making said composite as well as uses of said compounds Heraeus Materials Korea Corporation (KR) 2016-03-23 EP disclosed