SCHEMBL1763566

SCHEMBL1763566

CC(=O)[N+](C)(C)CO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL11595785 0.97
SCHEMBL9012228 0.75 TSHR (0.55)
SCHEMBL8915134 0.75
SCHEMBL27493498 0.73
Bromide SCHEMBL28957995 0.73 GALR3 (0.40)
Bromide SCHEMBL11714930 0.71
Hydrochloric Acid SCHEMBL29033932 0.69 CYP3A4 (0.38)
SCHEMBL4580388 0.69
SCHEMBL4249901 0.67
Hydrochloric Acid SCHEMBL30668518 0.67 BBOX1 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110118262-A1 Pyrrolidinyl and Piperidinyl Compounds Useful as NHE-1 Inhibitiors BOEHRINGER INGELHEIM INTERNATIONAL GMBH (DE) 2011-05-19 US disclosed
EP-2321274-A1 PYRROLIDINYL AND PIPERIDINYL COMPOUNDS USEFUL AS NHE-1 INHIBITORS Boehringer Ingelheim International GmbH (DE) 2011-05-18 EP disclosed
WO-2010005783-A1 PYRROLIDINYL AND PIPERIDINYL COMPOUNDS USEFUL AS NHE-1 INHIBITORS BOEHRINGER INGELHEIM INTERNATIONAL GMBH (DE) 2010-01-14 WO disclosed
US-4336322-A DYE RELEASING REDOX COMPOUND FUJI PHOTO FILM CO., LTD. (JP) 1982-06-22 US disclosed
US-4316974-A POLYAMIDEIMIDE COPOLYMERS ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1982-02-23 US disclosed
US-4315858-A PENICILLIN DERIVATIVES WARNER-LAMBERT COMPANY (US) 1982-02-16 US disclosed
US-4310641-A POLYAMIDE-IMIDE MODIFIED WITH A CINNAMOYL GROUP ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1982-01-12 US disclosed
US-4208477-A POLYAMIDEIMIDE COPOLYMER ENDCAPPED WITH ACRYLIC GROUPS, PHOTOINITIATOR, ETHYLENICALLY UNSATURATED COMPOUND ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1980-06-17 US disclosed
US-4180404-A Heat resistant photoresist composition and process for preparing the same ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1979-12-25 US disclosed