⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1763874 | 1.00 | — | — | |
| SCHEMBL88862 | 0.86 | — | — | |
| SCHEMBL776976 | 0.78 | — | — | |
| SCHEMBL18675 | 0.78 | — | — | |
| SCHEMBL2836890 | 0.78 | — | — | |
| SCHEMBL2464884 | 0.78 | — | — | |
| SCHEMBL333324 | 0.78 | — | — | |
| SCHEMBL105368 | 0.78 | — | — | |
| SCHEMBL6230404 | 0.74 | — | — | |
| SCHEMBL7638217 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250343048-A1 | ETCHING METHOD | RESONAC CORPORATION (JP) | 2025-11-06 | — | — | US | disclosed |
| EP-4481794-A1 | ETCHING METHOD | Resonac Corporation (JP) | 2024-12-25 | — | — | EP | disclosed |
| CN-118679554-A | Etching method | 株式会社力森诺科 | 2024-09-20 | — | — | CN | disclosed |
| WO-2023157441-A1 | ETCHING METHOD | 株式会社レゾナック | 2023-08-24 | — | — | WO | disclosed |
| US-8547011-B2 | Layered product, luminescence device and use thereof | ZEON CORPORATION (JP) | 2013-10-01 | — | — | US | disclosed |
| EP-1745922-B1 | MULTILAYER BODY, LIGHT-EMITTING DEVICE AND USE THEREOF | ZEON CORP (JP) | 2012-08-29 | — | — | EP | disclosed |
| EP-1867413-B1 | PROTECTIVE GAS FOR METAL PRODUCTION | CENTRAL GLASS CO LTD (JP) | 2012-08-22 | — | — | EP | disclosed |
| EP-1655772-B1 | SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND GAS FOR PLASMA CVD | TOKYO ELECTRON LTD (JP) | 2011-09-28 | — | — | EP | disclosed |
| US-20110124928-A1 | Gas production facility, gas supply container, and gas for manufacture of electronic devices | ZEON CORPORATION (JP) | 2011-05-26 | — | — | US | disclosed |
| US-7704893-B2 | Semiconductor device, method for manufacturing semiconductor device and gas for plasma CVD | TOKYO EECTRON LIMITED (JP) | 2010-04-27 | — | — | US | disclosed |
| US-7252886-B2 | Curable composition and process for producing cured fluorinated product | ASAHI GLASS COMPANY, LIMITED (JP) | 2007-08-07 | — | — | US | disclosed |
| US-20070020951-A1 | Fluorocarbon film and method for forming same | ZEON CORPORATION (JP) | 2007-01-25 | — | — | US | disclosed |
| EP-1745922-A1 | MULTILAYER BODY, LIGHT-EMITTING DEVICE AND USE THEREOF | ZEON CORPORATION (JP) | 2007-01-24 | — | — | EP | disclosed |
| EP-1744092-A1 | APPARATUS FOR PRODUCING GAS, VESSEL FOR SUPPLYING GAS AND GAS FOR USE IN MANUFACTURING ELECTRONIC DEVICE | OHMI, Tadahiro (JP) | 2007-01-17 | — | — | EP | disclosed |
| US-20060281883-A1 | Curable composition and process for producing cured fluorinated product | ASAHI GLASS COMPANY LIMITED (JP) | 2006-12-14 | — | — | US | disclosed |
| US-20060264059-A1 | Semiconductor device, method for manufacturing semiconductor device and gas for plasma cvd | ZEON CORPORATION (JP) | 2006-11-23 | — | — | US | disclosed |
| EP-1655772-A1 | SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND GAS FOR PLASMA CVD | TOKYO ELECTRON LIMITED (JP) | 2006-05-10 | — | — | EP | disclosed |
| US-20050247670-A1 | Method of dry etching, dry etching gas and process for producing perfluoro-2-pentyne | ZEON CORPORATION (JP) | 2005-11-10 | — | — | US | disclosed |
| CN-1669129-A | Dry etching method, dry etching gas, and method for producing perfluoro-2-pentyne | ZEON CORP (JP) | 2005-09-14 | — | — | CN | disclosed |
| EP-1542268-A1 | METHOD OF DRY ETCHING, DRY ETCHING GAS AND PROCESS FOR PRODUCING PERFLUORO-2-PENTYNE | Zeon Corporation (JP) | 2005-06-15 | — | — | EP | disclosed |